Lithography requirements continue to accelerate, but technical challenges and infrastructure limitations will likely prevent IC manufacturers from adopting EUV lithography until later than initially expected. Therefore, it is necessary for today's immersion scanners to not only satisfy 32 nm requirements, but also be extendible to 22 nm applications and beyond. To successfully extend immersion lithography, leading-edge scanners must provide an affordable lithography solution that delivers high production yields in a timely manner so chip makers can maximize profits.

Nikon developed the NSR-S620D (NA = 1.35), based on the new Streamlign platform, to meet the stringent overlay, throughput, and availability requirements for 32 nm double patterning, and provide extendibility to ≤ 22 nm applications. With the S620D supporting overlay capabilities down to 2 nm and throughput up to 200 wafers per hour, Nikon is once again enabling the next generation of IC manufacturing.