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The NSR-S620D
Enabling the Next Generation

The NSR-S620D was designed to meet the stringent overlay, throughput, and availability requirements for 32 nm double patterning, and provide extendibility to 22 nm applications. With the NSR-S620D, Nikon is once again enabling the next generation of IC manufacturing.

Learn More About the NSR-S620D
Learn More About the S620D Streamlign platform

NSR-S320F
Ultra-high productivity scanner for the most critical dry ArF applications		  
NSR-S210D
A high productivity KrF scanner for subcritical layers		  
NSR-SF155
The most cost-effective solution for subcritical layers

Nikon Ships New Immersion Scanner Delivering Industry-Leading Performance and Productivity
Nikon Satisfies Unique Requirements of MEMS, LEDs, and More with Mini Steppers - NEW
Nikon Announces New Dry ArF Scanner Delivering World-Class Overlay and Productivity
Nikon Supports SEMI HTU in Helping Students Recognize Rewarding Science-Based Careers
Nikon Receives Intel's Preferred Quality Supplier Award
Nikon Receives Intel's Prestigious Supplier Continuous Quality Improvement Award

 

 
 





 


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