Learn More About the NSR-S610C and the NSR-S609B
NSR-S310F
A high productivity ArF scanner for critical 65 nm applications
NSR-S210D
A high productivity KrF scanner for sub-critical layers
NSR-SF155
The most cost-effective solution for sub-critical layers
Nikon Corporation Receives Intel's Preferred Quality Supplier Award
Nikon Announces ArF immersion Scanner for Double Patterning
Nikon and KLA-Tencor Announce New Overlay Solution
Nikon Announces High Throughput i-Line Stepper
Nikon Ships Immersion Scanners to All Major Semiconductor Manufacturing Regions
Nikon NSR-S610C to be Used for Production of 43 nm NAND Flash
Nikon and Synopsys Announce Manufacturing-Aware DFM Solution for 45 nm and Below
Nikon Announces New ArF and KrF Scanners with 20% Higher Productivity
Nikon Ships World’s First 45 nm Production Immersion Scanner
