LithoVision is the premier technical event that brings industry experts together with the objective of sharing a global view of future lithography trends, challenges, and innovations with Nikon customers and industry partners. The eleventh annual LithoVision Technical Symposium will be held prior to SPIE Advanced Lithography on Sunday, February 23. For 2014, LithoVision will move to the Center for Performing Arts in downtown San Jose. This venue is conveniently located within walking distance from the Convention Center and area hotels.
With a focus on "Patterning to 7 nm and Beyond", LithoVision 2014 will include an afternoon of insightful technical presentations followed by a panel discussion with industry experts. An interactive poster session and reception will cap off the evening.
The 2014 agenda features a keynote address discussing the State-of-Lithography by Dr. Christopher Progler of Photronics, as well as presentations by representatives from Intel, KLA-Tencor, Applied Materials, Tokyo Electron, and Nikon examining the following topics:
- Industry Roadmap and Future Device Trends
- Enabling Production at 14 nm and Beyond
- Design to Yield
- Extending Immersion with Multiple Patterning and DSA
- Panel Session: Patterning to 7 nm and Beyond
The evening poster session showcases contributions from Nikon and a variety of partner companies across the industry.
Since the first event in 2004, LithoVision has been continually lauded for its exceptional technical content, as well as the enjoyable social format. You won't want to miss it, so reserve your space today!
Sunday, February 23, 2014
12:30 PM - 1:30 PM:
1:30 PM - 5:35 PM:
and Panel Discussion
5:35 PM - 7:15 PM:
Poster Session and Reception
Space is limited, so register today.