LithoVision is the premier technical event that brings industry experts together with the objective of sharing a global view of future lithography trends, challenges, and innovations. The tenth annual LithoVision Technical Symposium will be held at the Civic Auditorium in downtown San Jose prior to SPIE Advanced Lithography on Sunday, February 24, 2013.

LithoVision 2013 will include an afternoon of insightful technical presentations followed by a newly added panel discussion with industry experts. An interactive poster session and reception will cap off the evening.

The milestone 2013 agenda features representatives from Intel, AZ Electronic Materials, GLOBALFOUNDRIES, Fraunhofer IISB, Synopsys, Dai Nippon Printing Co., Ltd., Nikon, and more examining the following topics:

• Industry Roadmap and Future Device Trends
• Enabling Production Beyond 20 nm
• Computational Lithography in Practice
• Mask and Materials Challenges and Solutions for Next Generation Manufacturing
• Panel Session: 10 Years of Litho - A Review and Look Ahead

The evening poster session showcases contributions from Nikon, CEA-Leti, Mentor Graphics, KLA-Tencor, Tokyo Electron, JSR Micro, TOK, and more.

Since the first event in 2004, LithoVision has been continually lauded for its exceptional technical content, as well as the enjoyable social format. You won't want to miss it, so reserve your space today!