LithoVision is the premier technical event that brings industry experts together to share their insights and provide a view into the exciting future of lithography. The seventh annual LithoVision Technical Symposium will be held at the Civic Auditorium in downtown San Jose prior to SPIE Advanced Lithography on Sunday, February 21, 2010. The day's technical presentations will be followed by a poster session and reception.

LithoVision 2010 will again feature presentations and posters prepared by well-known experts from across our industry. In addition to Nikon presenters, the 2010 agenda features presentations by Yan Borodovsky from Intel and Kevin Lucas from Synopsys, in addition to a customer presentation by Samsung, with topics including:

• Industry Roadmap and Future Trends
• Enabling 32 nm Production
• EUVL Technology Development
• Immersion Lithography Extensions
• Advanced Imaging Solutions
• Double Patterning Mask Solutions and Future Trends

The evening poster session and reception will feature posters contributed by SOKUDO, Luminescent Technologies, TOK, Synopsys, Powerchip Semiconductor, Cymer, NuFlare Technology, TEL, JSR Micro, KLA-Tencor, Gigaphoton, and FUJIFILM.

Since its inception in 2004, LithoVision has maintained the reputation of being an exceptional technical event. You won't want to miss it, so reserve your space today!