LithoVision is the premier technical event that brings industry experts together with the objective of sharing a global view of future lithography trends, challenges, and innovations. The ninth annual LithoVision Technical Symposium will be held at the Civic Auditorium in downtown San Jose prior to SPIE Advanced Lithography on Sunday, February 12, 2012. The day's technical presentations will be followed by a poster session and reception.

LithoVision 2012 will be highlighted with presentations prepared by well-known experts from across our industry, including a keynote presentation by Dr. Geoffrey Yeap of Qualcomm. The 2012 agenda features the following topics:

• Industry Roadmap and Future Device Trends
  Masato Hamatani, Nikon Corporation
  Dr. Geoffrey Yeap, Qualcomm Incorporated
• Enabling Production Beyond 22 nm
  Shinji Wakamoto, Nikon Corporation
  Sam Sivakumar, Intel Corporation
• Enabling Computational Lithography
  Naoya Hayashi, Dai Nippon Printing Co., Ltd.
  Tomoyuki Matsuyama, Nikon Corporation
• EUVL Technology Challenges for HVM
  Katsuhiko Murakami, Nikon Corporation
• Extending Lithography with Alternative Solutions
  Dr. Soichi Owa, Nikon Corporation
  Dr. Gregg Gallatin, NIST
  Dr. Serge Tedesco, CEA-LETI
  

The evening poster session and reception will feature posters contributed by Nikon, Mentor Graphics, Gigaphoton, Tokyo Electron, JSR Micro, Cymer, Synopsys, and more.

Since its inception in 2004, LithoVision has been continually lauded for its excellent technical content. You won't want to miss it, so reserve your space today!