LithoVision is the premier technical event that brings industry experts together to share their insights and provide a view into the exciting future of lithography. The sixth annual LithoVision Technical Symposium will be held prior to SPIE Advanced Lithography on Sunday, February 22, 2009. The technical presentations will take place at the San Jose Civic Auditorium followed by a poster session and buffet reception at the Tech Museum of Innovation.
The agenda for this exclusive event includes:
- Featured presentations from Intel Corporation discussing the Industry Roadmap and Future Trends AND Advanced Micro Devices reviewing Immersion Lithography Performance and Production Integration
- Additional presentations by invited speakers from CEA-LETI, Cymer and Nikon covering:
- Immersion Lithography Performance
- Double Exposure/Double Patterning Technology and
Joint Development Program Update - EUVL Technology Development and Source Advancements
- Advanced Imaging Solutions
Event overview:
Sunday, February 22, 2009
12:30 PM to 1:30 PM:
Registration and Refreshments at San Jose Civic Auditorium
1:30 PM to 5:40 PM:
Technical Symposium at San Jose Civic Auditorium
5:40 PM to 8:00 PM:
Poster Session and Buffet Reception at the Tech Museum of Innovation
The 2009 event will feature an expanded poster session and reception including contributions by leading industry suppliers such as Synopsys, TEL, Sokudo, Philips Extreme UV, JSR Micro, KLA-Tencor, Litel, AMTC, Cadence, Mentor Graphics, AZ Electronic Materials, FUJIFILM, and TOK.
Space is limited, so register today!
