2004
11.30.04 Nikon
Pushes Dry Lithography below the 65 nm Node with POLANO
11.11.04 Nikon
Announces New KrF Scanner with 25% Higher Productivity
09.29.04 Nikon,
ASML and Carl Zeiss SMT Sign Memorandum to Settle
09.02.04 Nikon
And Asml Agree To Suspend Legal Proceedings
07.08.04 Nikon
Extends Tool Performance with New Enhancements
03.22.04 Nikon
Corporation Wins Intel’s Preferred Quality Supplier Award
02.23.04 Nikon
Announces New System with World’s Highest NA Lens
02.19.04 Nikon
Accelerates Development Plans for ArF Immersion
02.04.04 Nikon
Announces New Worldwide Training Center to Meet Growing Demand
01.14.04 Nikon
to Start Full-Scale Product Development of EUVL System
2003
12.01.03 Nikon Announces Immersion Lithography
Product Schedule
11.19.03 Nikon Announces New High Productivity System
07.11.03 Nikon Wins CMP order for 65 nm Copper/Low K processing
07.08.03 Nikon Reduces IC Manufacturing Costs with New System
07.08.03 Nikon Introduces Next Generation KrF Scanner for Advanced 110
nm Devices
07.08.03 Nikon Launches Next Generation Scanner for Advanced 80nm Devices
07.07.03 Nikon Ships Next-Generation
Electron Beam Stepper to Selete
07.07.03 Nikon and TEL Agree on Joint
Development of Liquid Immersion Technology
07.04.03 Nikon and Dainippon Screen Announce
Joint Development Effort
05.12.03 Nikon Appeals ITC Decision
05.06.03 Nikon Precision to Ship ArF
Scanners to Clariant AZ Electronic Materials
05.02.03 Nikon Taps Director
03.28.03 Nikon Wins Intel's Preferred
Quality Supplier Award
03.17.03 Nikon to appeal ITC's decision
03.01.03 Nikon
CEO Promotions
01.29.03 Nikon will appeal ITC Judge's
decision

2002
10.18.02 Nikon Corporation filed a complaint in the U.S.
08.26.02 Nikon Presents Update Regarding
Litigations with ASML
07.12.02 New ultra-high-N.A. KrF scanner,
the NSR-S206D
07.12.02 New cost-effective i-line stepper,
the NSR-SF120
05.28.02 Nikon Bond Offering Attracts
Intel
03.20.02 90 nm devices on Nikon tools
03.01.02 Nikon and JSR form pact
02.01.02 New NPI president

2001
12.21.01 Complaint filed against ASML
06.27.01 S306C introduction
01.18.01 NEST Manager introduction
2000
07.10.00 S205C introduction
07.05.00 Nikon/Numerical form pact
02.15.00 New orders
01.06.00 SF100 introduction |