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2004

11.30.04    Nikon Pushes Dry Lithography below the 65 nm Node with POLANO

11.11.04    Nikon Announces New KrF Scanner with 25% Higher Productivity

09.29.04    Nikon, ASML and Carl Zeiss SMT Sign Memorandum to Settle

09.02.04    Nikon And Asml Agree To Suspend Legal Proceedings

07.08.04    Nikon Extends Tool Performance with New Enhancements

03.22.04    Nikon Corporation Wins Intel’s Preferred Quality Supplier Award

02.23.04    Nikon Announces New System with World’s Highest NA Lens

02.19.04    Nikon Accelerates Development Plans for ArF Immersion

02.04.04    Nikon Announces New Worldwide Training Center to Meet Growing Demand

01.14.04    Nikon to Start Full-Scale Product Development of EUVL System

2003

12.01.03    Nikon Announces Immersion Lithography Product Schedule

11.19.03    Nikon Announces New High Productivity System

07.11.03    Nikon Wins CMP order for 65 nm Copper/Low K processing

07.08.03    Nikon Reduces IC Manufacturing Costs with New System

07.08.03    Nikon Introduces Next Generation KrF Scanner for Advanced 110 nm Devices

07.08.03    Nikon Launches Next Generation Scanner for Advanced 80nm Devices

07.07.03    Nikon Ships Next-Generation Electron Beam Stepper to Selete

 07.07.03    Nikon and TEL Agree on Joint Development of Liquid Immersion Technology

07.04.03    Nikon and Dainippon Screen Announce Joint Development Effort

05.12.03    Nikon Appeals ITC Decision

05.06.03    Nikon Precision to Ship ArF Scanners to Clariant AZ Electronic Materials

05.02.03    Nikon Taps Director

03.28.03    Nikon Wins Intel's Preferred Quality Supplier Award

03.17.03    Nikon to appeal ITC's decision

03.01.03    Nikon CEO Promotions

01.29.03    Nikon will appeal ITC Judge's decision

2002

10.18.02    Nikon Corporation filed a complaint in the U.S.

08.26.02    Nikon Presents Update Regarding Litigations with ASML

07.12.02    New ultra-high-N.A. KrF scanner, the NSR-S206D

07.12.02    New cost-effective i-line stepper, the NSR-SF120

05.28.02    Nikon Bond Offering Attracts Intel

03.20.02    90 nm devices on Nikon tools

03.01.02    Nikon and JSR form pact

02.01.02    New NPI president

2001

12.21.01    Complaint filed against ASML

06.27.01    S306C introduction

01.18.01    NEST Manager introduction
2000

07.10.00    S205C introduction

07.05.00    Nikon/Numerical form pact

02.15.00    New orders

01.06.00    SF100 introduction





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