IEEE/SEMI ASMC 2008 May 5 – 7, 2008 Hyatt Regency Cambridge Cambridge, Massachusetts
2008 SEMATECH Litho Forum and EUV Source Workshop May 12 – 14, 2008 The Sagamore Bolton Landing, New York
Nikon Corporation Receives Intel's Preferred Quality Supplier Award Nikon Announces ArF immersion Scanner for Double Patterning Nikon and KLA-Tencor Announce New Overlay Solution Nikon Announces High Throughput i-Line Stepper Nikon Ships Immersion Scanners to All Major Semiconductor Manufacturing Regions of the World Nikon NSR-S610C to be Used for Production of 43 nm NAND Flash Nikon and Synopsys Announce Manufacturing-Aware DFM Solution for 45 nm and Below Nikon Announces New ArF and KrF Scanners with 20% Higher Productivity Nikon Ships World’s First 45 nm Production Immersion Scanner Nikon and CEA-Leti Announce Partnership for Double Patterning and Double Exposure Technology Powerchip Orders Nikon Immersion Scanner for Next-Generation Memory Line
