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IEEE/SEMI ASMC 2008
May 5 – 7, 2008
Hyatt Regency Cambridge
Cambridge, Massachusetts

 

2008 SEMATECH Litho Forum and EUV Source Workshop
May 12 – 14, 2008
The Sagamore
Bolton Landing, New York

 
 

Nikon Corporation Receives Intel's Preferred Quality Supplier Award
Nikon Announces ArF immersion Scanner for Double Patterning
Nikon and KLA-Tencor Announce New Overlay Solution
Nikon Announces High Throughput i-Line Stepper
Nikon Ships Immersion Scanners to All Major Semiconductor Manufacturing Regions of the World
Nikon NSR-S610C to be Used for Production of 43 nm NAND Flash
Nikon and Synopsys Announce Manufacturing-Aware DFM Solution for 45 nm and Below
Nikon Announces New ArF and KrF Scanners with 20% Higher Productivity
Nikon Ships World’s First 45 nm Production Immersion Scanner
Nikon and CEA-Leti Announce Partnership for Double Patterning and Double Exposure Technology
Powerchip Orders Nikon Immersion Scanner for Next-Generation Memory Line

Nikon presents and exhibits at semiconductor industry exhibitions and conferences throughout the year. See the full schedule.
Learn about the latest from Nikon Precision or visit our press release archives.
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