02.20.13   Nikon Announces New Immersion Scanner for Most Demanding Double Patterning Applications

02.01.12   Nikon Ships New Immersion Scanner Delivering Industry-Leading Performance and Productivity

12.05.11   Nikon Announces New Dry ArF Scanner Delivering World-Class Overlay and Productivity

09.29.11   Nikon Supports SEMI HTU in Helping Students Recognize Rewarding Science-Based Careers

04.20.11   Nikon Corporation Receives Intel's Preferred Quality Supplier Award

03.04.10   Nikon Corporation Receives Intel's Preferred Quality Supplier Award

03.05.09   Nikon Corporation Receives Intel's Prestigious Supplier Continuous Quality Improvement Award

08.06.08    Nikon Corporation to Build Two New Buildings for Production of IC Steppers and Scanners

03.18.08    Nikon Corporation Receives Intel's Preferred Quality Supplier Award

02.20.08    Nikon Announces ArF immersion Scanner for Double Patterning

12.03.07    Nikon and KLA-Tencor Announce New Overlay Solution

11.29.07    Nikon Announces High Throughput i-Line Stepper

11.29.07    Nikon Ships Immersion Scanners to All Major Semiconductor Manfucturing Regions

10.18.07    Nikon NSR-S610C to be Used for Production of 43 nm NAND Flash

09.18.07    Nikon and Synopsys Announce Manufacturing-Aware DFM Solution for 45 nm and Below

07.11.07    Nikon Announces New ArF and KrF Scanners with 20% Higher Productivity

02.28.07    Nikon Ships World’s First 45 nm Production Immersion Scanner

02.27.07    Nikon and CEA-Leti Announce Partnership for DP and Double Exposure Technology