03.18.08    Nikon Corporation Receives Intel's Preferred Quality Supplier Award

02.20.08    Nikon Announces ArF immersion Scanner for Double Patterning

12.03.07    Nikon and KLA-Tencor Announce New Overlay Solution

11.29.07    Nikon Announces High Throughput i-Line Stepper

11.29.07    Nikon Ships Immersion Scanners to All Major Semiconductor Manfucturing Regions

10.18.07    Nikon NSR-S610C to be Used for Production of 43 nm NAND Flash

09.18.07    Nikon and Synopsys Announce Manufacturing-Aware DFM Solution for 45 nm and Below

07.11.07    Nikon Announces New ArF and KrF Scanners with 20% Higher Productivity

02.28.07    Nikon Ships World’s First 45 nm Production Immersion Scanner

02.27.07    Nikon and CEA-Leti Announce Partnership for Double Patterning and Double Exposure Technology

12.14.06    Powerchip Orders Nikon Immersion Scanner for Next-Generation Memory Line

11.20.06    Nikon Announces New Ultra High Throughput Stepper

10.10.06    Nikon and Brion Partner to Deliver Optimized DFM Lithography Solutions

09.20.06    Nikon and Synopsys Collaborate to Deliver Advanced DFM Lithography Solutions

07.06.06    Nikon Announces World’s First Scanner for 45 nm Volume Production

02.16.06    Nikon Ships World’s First Production Immersion System

07.07.05    Nikon Reduces Cost of Ownership with New System

06.30.05    Nikon Announces the World’s First Hyper NA Immersion System