03.18.08 Nikon
Corporation Receives Intel's Preferred Quality Supplier Award
02.20.08 Nikon Announces ArF immersion Scanner for Double Patterning
12.03.07 Nikon and KLA-Tencor Announce New Overlay Solution
11.29.07 Nikon Announces High Throughput i-Line Stepper
11.29.07 Nikon Ships Immersion Scanners to All Major Semiconductor Manfucturing Regions
10.18.07 Nikon NSR-S610C to be Used for Production of 43 nm NAND Flash
09.18.07 Nikon and Synopsys Announce Manufacturing-Aware DFM Solution for 45 nm and Below
07.11.07 Nikon Announces New ArF and KrF Scanners with 20% Higher Productivity
02.28.07 Nikon
Ships World’s
First 45 nm Production Immersion Scanner
02.27.07 Nikon
and CEA-Leti Announce Partnership for Double Patterning and Double
Exposure Technology
12.14.06 Powerchip Orders Nikon Immersion Scanner for Next-Generation Memory Line
11.20.06 Nikon Announces New Ultra High Throughput Stepper
10.10.06 Nikon and Brion Partner to Deliver Optimized DFM Lithography Solutions
09.20.06 Nikon
and Synopsys Collaborate to Deliver Advanced DFM Lithography
Solutions
07.06.06 Nikon
Announces World’s
First Scanner for 45 nm Volume Production
02.16.06 Nikon Ships World’s
First Production Immersion System
07.07.05 Nikon Reduces Cost of Ownership with New System
06.30.05 Nikon
Announces the World’s First Hyper NA Immersion
System
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