Nikon and CEA-Leti
Announce Partnership for Double Patterning and Double Exposure
Technology
Belmont, California – February 27, 2007 – Nikon
Corporation announced today a Joint Development Program with
CEA-Leti, one of Europe’s leading microelectronics research
centers focused on optical lithography development for technology
beyond 45 nm. The work will examine the potential of Double Exposure
and Double Patterning for 32 nm semiconductor devices, and will
utilize a leading-edge Nikon scanner located in CEA-Leti’s
Nanotec 300 research facility.
Double Patterning was added to the ITRS roadmap in 2006 as a
potential solution for 32 nm lithography. EUVL and high-index
immersion are also listed as potential solutions on the ITRS
roadmap, but the development timeline for those technologies
may limit them from being used for 32 nm applications. Nikon
is working with key research centers and leading-edge IC manufacturers,
as well as partnering with design, mask, and resist companies
to ensure a manufacturable solution is available in time for
the 32 nm node.
“CEA-Leti offers an outstanding, state-of-the-art facility
with all of the processes required for Double Patterning,” stated
Toshikazu Umatate, Executive Officer, Precision Equipment Company,
Nikon Corporation. “Our collaboration with Leti enables
us to leverage their process expertise and our lithography knowledge
to develop the best exposure tools and processes for this challenging
technology.”
"The partnership with Nikon is a great opportunity to develop
all aspects of Double Processing with one of the world’s
leading equipment suppliers" said Olivier Demolliens, head
of the Nanotec Division at CEA-Leti. "DE/DP is the main
solution foreseen for the 32 nm node, bridging the gap between
immersion and EUV, but there are still a lot of issues that need
to be addressed on equipment, process, mask and CAD. Together
with Nikon equipment and expertise, we have built a consortium
that will address all these developments."
About Nikon
Since 1980, Nikon Corporation has been revolutionizing
lithography with innovative products and technologies. The company
is a worldwide leader in lithography equipment for the microelectronics
manufacturing industry with more than 7,800 exposure systems installed
worldwide. Nikon offers the most extensive selection of production-class
steppers and scanners in the industry. These products serve the
semiconductor, flat panel display (LCD) and thin-film magnetic
head (TFH) industries. For more information about Nikon,
access our web site at www.nikon.co.jp
About CEA-Leti
The CEA (French Atomic Energy Commission), a public organization
for technological research, carries out its missions in the
domains of energy, information and health technologies, and
defense, building on the foundations of fundamental research
at the highest level. Strengthened by the competence of its
15,000 researchers and collaborators, it is recognized internationally
and constitutes a strong source of original ideas for public
authorities, institutions, and industries in France and in
Europe.
Located in Grenoble, CEA-Leti (Electronics and Information Technology
Laboratory of the French Atomic Energy Commission) is at the
leading edge of European research in microelectronics, microtechnology
and nanotechnology. It employs nearly 1000 people and generates
around 200 patents per year. With 28 start-ups created or in
the course of creation, it is one of the most important partners
of the industrial world. Instigator of the MINATEC® pole
of innovation, CEA-Leti is also one of its principal partners,
beside the INP Grenoble (Grenoble Institute of Technology) and
the local authorities.
For more information about CEA , access www.cea.fr.
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Contact:
Bernie Wood
Director of Marketing
Nikon Precision Inc.,
(650) 413-8533 phone
bwood@nikon.com
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