| Nikon Announces the World’s
First Hyper NA Immersion System
New Tandem Stage system enables 45 nm process development
Belmont, California – June 30, 2005 – Nikon
Corporation has developed the world’s first lithography
system with a hyper NA lens. The NSR-S609B, an ArF immersion
scanner with the industry’s highest NA projection lens
of 1.07, is targeted at mass production of 55 nm and development
of 45 nm devices. The system includes several new innovations,
including the proprietary Nikon Local Fill Technology and a new
Tandem Stage design, which enable the system to achieve extremely
high throughput of 130 wafers or more per hour.
Nikon Local Fill Technology allows wafers to be processed at
high scan speeds of 500 mm/sec or faster with no water spots
or backside wafer contamination. A major concern of customers
when discussing immersion lithography is micro bubbles. In repeated
demonstrations, the Nikon Local Fill Technology has been proven
to be free from micro bubbles and other immersion specific defects.
To increase throughput, improve accuracy, and enhance the long
term stability of the NSR-S609B, Nikon developed a new Tandem
Stage design that utilizes two stages with different functions
to optimize the performance of the tool for immersion lithography.
The Exposure Stage is designed to process at very high rates,
while the Calibration Stage is used to calibrate the tool between
each wafer exchange. The result is a system with high throughput
and improved accuracy. Alignment accuracy has been reduced to
7 nm or less with the Tandem Stage. Additionally, any risk of
fluctuations or variations over time in the immersion process
is eliminated by frequent calibration checks.
By equipping the system with POLANO, Nikon’s advanced
polarized illumination system, resolution of 50 nm for production
applications can be achieved. POLANO improves image contrast
by 20 percent, resulting in superior resolution, increased depth
of focus, and improved critical dimension (CD) uniformity.
About Nikon
Since 1980, Nikon Corporation has been revolutionizing lithography with innovative
products and technologies. The company is a worldwide leader in lithography
equipment for the microelectronics manufacturing industry with more than 7,600
exposure systems installed worldwide. Nikon offers the most extensive selection
of production-class steppers and scanners in the industry. These products serve
the semiconductor, flat panel display (LCD) and thin-film magnetic head (TFH)
industries. Nikon Precision Inc. provides service, training, applications and
technical support, as well as sales and marketing for Nikon lithography equipment
in North America. For more information about Nikon, access our web site at www.nikonprecision.com
Forward Looking Statements
This press release contains forward-looking statements as that
term is defined in the Private Securities Reform Act of 1995,
which are subject to known and unknown risks and uncertainties
that could cause actual results to differ materially from those
expressed or implied by such statements. Such statements are
subject to risks, uncertainties and changes in condition, particularly
those related to industry requirements and other risks. The
Company undertakes no obligation to update the information
in this press release.
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Contact:
Bernie Wood
Director of Marketing
Nikon Precision Inc.,
(650) 413-8533 phone
bwood@nikon.com |
