| Nikon Announces Latest i-line Step-and-Repeat
Exposure System -- NSR-SF120
High Throughput Scan-Field Stepper Mix-and-Matches to
DUV Scanners
July 12, 2002 -
To create the most cost-effective tool for sub-critical layers
of next-generation DRAMs and MPUs, Nikon Corporation has developed
a new i-line scan-field stepper, the NSR-SF120. The NSR-SF120
is designed to realize the superior cost performance of a mix-and-match
strategy with Nikon DUV scanners, which are now the main systems
in state-of-the-art semiconductor fab lines.
Boasting throughput of at least 100 wafers/hour for 300 mm wafers,
and 120 wafers/hour for 200 mm wafers, the NSR-SF120 achieves
a resolution of 280 nm or better on a large exposure field of
25 x 33 mm.
Nikon was the first in the industry to develop a new-concept
i-line stepper specifically for mix-and-match with KrF lens-scanning
steppers. Order acceptance for that first generation, the NSR-SF100,
began in January 2000.
| Specification Summary |
| Resolution |
280 nm or better |
| Numerical Aperture (N.A.) |
0.62 |
| Light Source |
i-line (365 nm) |
| Projection Magnification |
1:4 |
| Exposure Field |
25 x 33 mm |
| Alignment Accuracy |
35 nm or less (M+ 3 s) |
| Throughput |
300 mm wafers, 100 wafers/hr or more
200 mm wafers, 120 wafers/hr or more |
With the same reduction ratio and field size as Nikon's DUV
scanners, these i-line steppers are ideal for exposing sub-critical
layers, which can comprise roughly half of the 20 or more layers
of a device. These characteristics, combined with high throughput,
provide a superior combination of cost performance and productivity
to help reduce capital costs.
The NSR-SF120 is designed to operate in a manner similar to
the scanning-type KrF steppers NSR-S204B, NSR-S205C, and NSR-S206D,
as well as with the ArF steppers NSR-S305B and NSR-S306C. A newly
developed high-N.A. lens enables a leap in i-line resolution
to 280 nm. The system can effectively expose sub-critical layers
to support the 130-100 nm device node while offering high throughput
for the 300 mm age.
About Nikon: Nikon Corporation is the world leader in lithography
equipment for the microelectronics manufacturing industry with
a 40% market share and more than 7,000 exposure systems installed
worldwide, including over 700 DUV scanning systems. Nikon offers
the most extensive selection of production-class steppers and
scanners in the industry. These products serve the wafer, photomask,
flat panel display (LCD) and thin-film magnetic head (TFH) industries.
Nikon Precision Inc. provides service, training, applications
and technical support, as well as sales and marketing for Nikon
lithography equipment in North America.
###
Susan Bernardi
Nikon Precision Inc.
(650) 508-3819
sbernardi@nikon.com |
