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The Nikon NSR-S210D KrF scanner and NSR-S310F ArF scanner are cost-effective “dry” lithography systems that satisfy rigorous resolution, overlay, and productivity requirements. The S310F and S210D adopt the same platform as the NSR-S610C immersion scanner, using the Tandem Stage to deliver excellent performance and cost of ownership.

Most recently, Nikon announced the NSR-S320F scanner delivering ultra-high productivity and superior overlay accuracy for the most challenging dry ArF layers. The S320F adopts the Streamlign platform already employed globally and delivering optimal cost of ownership for NSR-S620D immersion scanners. The successful combination of the Stream Alignment and Five-Eye FIA systems enable world-class throughput capabilities of up to 200 wafers per hour. In addition, the proven Bird’s Eye Control system uses interferometers in conjunction with encoders to deliver overlay accuracy ≤ 3 nm with optimal stability, while the mature Modular² Structure simplifies installation and maintenance functions. The S320F scanners begin shipping in the fourth quarter of 2011.
Ultra-high productivity scanner for the most critical dry ArF applications   A high productivity KrF scanner for sub-critical layers
 
Cost-effective ArF scanner for 65 nm applications      




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