Delivers world-class dry ArF performance and productivity with the proven Streamlign platform
The semiconductor industry is currently transitioning to development and high volume manufacturing of 20 nm generation process devices, with the most critical layers exposed using ArF immersion scanners and incorporating double patterning. However, to minimize costs many layers will still be processed using dry single exposure lithography. To achieve this, dry ArF scanners that are able to deliver ultra-high productivity with overlay accuracy comparable to immersion systems are imperative. The NSR-S320F is the most advanced dry ArF scanner for high volume manufacturing, and fully satisfies these challenging requirements. The S320F adopts the Streamlign Platform, already employed globally and delivering optimal cost of ownership for NSR-S620D immersion scanners, to deliver ultra-high productivity and superior overlay accuracy for the most challenging dry ArF layers.
Overlay accuracy down to 3 nm enables superior yield
Interferometers alone cannot sufficiently measure stage position to satisfy the most stringent dry ArF overlay requirements. Therefore, the NSR-S320F adopts the proven Bird's Eye Control system, which uses laser encoders with interferometers to accurately determine wafer position. This hybrid method improves accuracy and stability with no impact to throughput. These innovations enable superior focus control and target 3 nm overlay performance to deliver maximized yield for advanced dry ArF applications.
Throughput up to 200 WPH provides optimal affordability
To minimize costs associated with immersion double patterning, many challenging layers will still be processed using dry single exposure lithography. Therefore, S320F throughput is a critical factor in making advanced processes cost effective for manufacturing. The S320F Stream Alignment wafer mapping system utilizes multiple alignment microscopes (Five-Eye FIA) and a wide area autofocus sensor (Straight Line Autofocus) that spans the wafer to dramatically reduce overhead time. Together, these innovations enable world-class throughput capabilities of up to 200 wafers per hour.
Modular design streamlines installation and repairs
Being first to market with new devices can be the difference between profit and loss. To help customers meet this challenge, the S320F incorporates the mature Modular² Structure also used on the NSR-S620D to streamline system installation and minimize time to production. The Modular² Structure uses standalone subassemblies to improve system setup, and simplify assembly and maintenance.
Established lens technology ensures exceptional imaging
The S320F features the proven Nikon 0.92 numerical aperture projection lens to deliver resolution of 65 nm or better, with optimal CD uniformity. Superior materials and proprietary manufacturing technology provide a virtually perfect lens that is essentially flare free and has the industry’s lowest aberration levels. Additionally, POLANO polarization control enhances image contrast and reduces mask error factor (MEF) without any loss of illumination power or throughput.
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NSR-S320F
