Uses proven technology for KrF applications ≤ 110
nm
The NSR-S210D combines technology advancements from leading-edge
dry and immersion systems to provide a high productivity KrF
scanner for high volume applications. The S210D features
the proven Nikon 0.82 numerical aperture projection lens to deliver
resolution of 110 nm or better, with optimal CD uniformity.
Tandem Stage delivers ≥ 176
WPH and optimal stability
The S210D adopts the same platform as the NSR-S610C immersion
scanner, using the Tandem Stage to provide superior performance
with excellent cost of ownership. This high productivity platform
enables the NSR-S210D to deliver throughput ≥ 176 wafers per
hour.
Excellent cost of ownership
NSR-S210D throughput was improved by 20% over the previous generation system.
This is made possible by increased wafer stage speed (600 mm/sec), a faster
reticle stage, and reduced alignment time. Together with excellent uptime,
ease of maintenance, and the extensive use of auto-calibration functions, the
S210D delivers lower cost of ownership compared to KrF scanners from other
manufacturers.
Superior overlay accuracy (≤ 9
nm)
The Tandem Stage design uses only one stage for exposure, with
the other used for calibrations during wafer exchange. This eliminates
stage mismatching error and enables frequent calibrations to
enhance overlay performance and scanner stability over time. The
S210D delivers overlay accuracy ≤ 9 nm.
Industry’s most advanced lens design provides
world-class imaging
Superior Nikon materials and proprietary manufacturing technology
provide a virtually perfect lens that is essentially flare free
and has the industry’s lowest aberration levels. The S210D
employs the advanced iMAC lens controller to provide optimal
lens tuning flexibility and includes comprehensive environmental
control systems to ensure that lens quality is maintained over
the lifetime of the tool.
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NSR-S320F
