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  • High throughput scan-field stepper (i-line)
  • Same exposure field as DUV scanners makes mix-and-match easy for sub-critical layers
  • Resolution of ≤ 280 nm
  • Industry’s most advanced lens design and control for superior imaging
  • Excellent cost of ownership

Wavelength (nm) 365
Lens-NA 0.62
Exposure Area (mm) 26 x 33
Reduction Ratio 1/4
Resolution (nm) ≤ 280
Throughput:  
300 mm ≥ 120
200 mm ≥ 120
Wafer Size 200/300
High throughput scan-field stepper
Nikon was first in the industry to develop a new concept i-line stepper specifically for mix-and-match with DUV scanners. With throughput of ≥ 120 WPH, the fifth generation scan-field stepper — the NSR-SF140, is a cost-effective system for sub-critical layers of next-generation memory and microprocessors.

Ideal for mix-and-match applications
Historically, a common problem when using steppers and scanners in the same process flow was matching the field sizes. The SF140 makes use of leading-edge lens technology to enable the same wide exposure field (26 x 33 mm) as KrF and ArF scanners, simplifying mix-and-match applications while maximizing productivity.

Optimum lens stability using the industry’s most advanced lens design
The SF140 uses the highly advanced Nikon lens controller to fine tune lens performance real time, as well as adjust for aberration change due to atmospheric pressure changes and compensate for aberration changes due to irradiation. This system also delivers enhanced magnification compensation and reduced lens distortion.

Excellent cost of ownership
The SF140 delivers high throughput on a cost-effective platform, resulting in low cost of ownership (COO) for i-line applications. Also, a stepper is a much simpler system than a scanner, resulting in higher uptime, lower capital costs, and reduced operating costs. Together, these elements make the SF140 an effective solution for sub-critical layers.

Demonstration of large depth of focus achieved with i-line scan field stepper.





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