Next generation lithography techniques continue to evolve, therefore to stay competitive, customers need innovative lithography solutions to keep them on their aggressive technology roadmaps.

In January 2006, Nikon shipped the world’s first hyper-NA immersion lithography system—the NSR-S609B. This was followed by the NSR-S610C, the industry’s first 1.30 NA immersion scanner for 45 nm half-pitch production, in February 2007. Later that year, Nikon introduced the cost-effective NSR-S310F and NSR-S210D scanners. These “dry” lithography systems adopted the same platform as the NSR-S610C, using the Tandem Stage to provide superior performance with excellent cost of ownership.

In 2009, Nikon began shipping the NSR-S620 immersion scanner. Nikon developed the S620D (NA = 1.35), based on the new Streamlign platform, to not only enable double patterning (DP) lithography at 32 nm, but to provide extendibility to next-generation applications. The Streamlign platform Bird’s Eye Control system provides overlay capabilities that enable the superior yield required for advanced processes, while Stream Alignment reduces wafer overhead time to maximize throughput and enable excellent productivity. In addition, the Modular² Structure shortens installation time to enable rapid production ramps, and provides multigenerational platform capabilities.

In 2011, Nikon announced the Streamlign platform-based NSR-S320F scanner to deliver exceptional performance and productivity for the most challenging dry ArF applications. Most recently, Nikon began shipping the NSR-S621D immersion scanner, the latest evolution of the proven Streamlign platform, to satisfy the increasingly demanding requirements for imaging, overlay accuracy, and ultra-high productivity that are essential for cost-effective 22 nm applications and beyond.

Nikon is also engaged in developing EUVL systems for applications beyond the 16 nm half-pitch.

Nikon. Evolution in Action.