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Overcoming the many technical and business challenges of lithography requires an active and ongoing collaboration between industry leaders. That's why Nikon continues to play a significant role at industry conferences and events.

For a complete copy of any of the Nikon papers presented during these conferences, please email us at npicom@nikon.com.

#7636-67	Contamination Study on EUV Exposure Tools Using SAGA Light Source
#7636-81	Flare Modeling and Calculation for EUV Optics
#7638-122	Electrical Effects of Corner Serif OPC
#7640-06	Tolerancing Analysis of Customized Illumination for Practical Applications of Source & Mask Optimization
#7640-09	Actual Performance Data Analysis of Overlay, Focus and Dose Control of an Immersion Scanner for DP
#7640-16	Double Patterning Lithography Study with High Overlay Accuracy
#7640-26	Experimental Result of Polarization Characteristics Separation Method
#7640-30	Impact of Scanner Signatures on Optical Proximity Correction
#7640-32	Topcoat-less Resist Approach for High Volume Production and Yield Enhancement of Immersion Lithography
#7640-40	Simultaneous Optimization of Dose and Focus Controls in Advanced ArF Immersion Scanners
#7640-52	Illumination Optics for Source-Mask Optimization
#7640-58	Latest Performance of Immersion Scanner S620D with the Streamlign Platform for the Double Patterning Generation

#7273-160	Practical Implementation of Immersion Resist Materials
#7274-07	A Study of Source & Mask Optimization for ArF Scanners
#7274-29	Scanner-dependent Optical Proximity Effects
#7274-30	Challenges and Solutions in the Calibration of Projection Lens Pupil-Image Metrology Tools
#7274-31	Achieving Overlay Budgets for Double Patterning
#7274-54	An Innovative Platform for High-Throughput, High Accuracy Lithography Using a Single Wafer Stage
#7274-58	Polarization Aberration Control for ArF Projection Lenses
#7274-61	Control and Reduction of Immersion Defectivity for Yield Enhancement at High Volume Production

#6921-22	Nikon EUVL Development Progress Update
#6921-26	Development Status of Projection Optics and Illumination Optics for EUV1
#6922-107	A System to Optimize Mix-and-Match Overlay in Lithography
#6924-26	Double Patterning Requirements for Optical Lithography and Prospects for Optical Extension Without Double Patterning
#6924-34	Polarization Characteristics of State-of-Art Lithography Optics Reconstructed From On-Body Measurement
#6924-38	Studies of High Index Immersion Lithography
#6924-43	Immersion Defectivity Study with Volume Production Immersion Lithography Tool for 45 nm Node and Below
#6924-58	Recent Performance Results of Nikon Immersion Lithography Tools
#6924-63	An Intelligent Imaging System for ArF Scanner
#6924-66	Thermal Aberration Control in Projection Lens

#6517-06	Nikon EUVL Development Progress Update
#6517-18	Development of Optics for EUV Lithography Tools
#6517-107	Carbon Deposition on Multi-Layer Mirrors by Extreme Ultra Violet Ray Irradiation
#6518-105	Improved Overlay Control Through Automated High Order Compensation
#6519-11	Adapting Immersion Exposure to Mass Production by Adopting a Cluster of Novel Resist-Coating/Developing and Immersion - Exposure Equipment
#6519-12	Immersion Defectivity Control by Optimizing Immersion Materials and Processes
#6520-06	Current Status of High Index Immersion Lithography Development
#6520-14	Polarization Dependent Proximity Effects
#6520-42	Immersion Defectivity Study with Volume Production Immersion Lithography Tool
#6520-67	Latest Results from the Hyper-NA Immersion Scanners S609B and S610C
#6520-72	Catadioptric Projection Lens for 1.3 NA Scanner
#6520-105	Thermal Aberration Control for Low K₁ Lithography
#6520-106	Quasi-Telecentricity: the Effects of Unbalanced Multipole Illumination
#6520-118	Visualizing the Impact of the Illumination Distribution upon Imaging, and Applying the Insights Gained
#6520-135	Scanner-Characteristics-Aware OPC Modeling and Correction
#6521-45	Scanner Parameter Sensitivity Analysis for OPE



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