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Overcoming the many technical and business challenges of lithography requires an active and ongoing collaboration between industry leaders. That's why Nikon continues to play a significant role at industry conferences and events.

For a complete copy of any of the Nikon papers presented during these conferences, please email us at npicom@nikon.com.

SPIE Advanced Lithography 2011

#7969-21	A Simple Modeling of Carbon Contamination on EUV Exposure Tools Based on Contamination Experiments with Synchrotron Source
#7969-23	Development of EUV Lithography Tools in Nikon
#7973-17	Scanner Alignment Performance for Double Patterning
#7973-31	An Aberration Control of Projection Optics for Multi-patterning Lithography
#7973-34	Stability and Calibration of Overlay and Focus Control for a Double Patterning Immersion Scanner
#7973-35	Advanced CDU Control for 22 nm and Below
#7973-50	Practical Performance and Enabling Technologies in Immersion Scanners for Double Patterning Generation
#7973-52	Pupilgram Adjusting Scheme Using Intelligent Illuminator for ArF Immersion Exposure Tool
#7973-71	A Simple Method of Source Optimization for Advanced NAND FLASH Process

SPIE Advanced Lithography 2010

#7636-67	Contamination Study on EUV Exposure Tools Using SAGA Light Source
#7636-81	Flare Modeling and Calculation for EUV Optics
#7638-122	Electrical Effects of Corner Serif OPC
#7640-06	Tolerancing Analysis of Customized Illumination for Practical Applications of Source & Mask Optimization
#7640-09	Actual Performance Data Analysis of Overlay, Focus and Dose Control of an Immersion Scanner for DP
#7640-16	Double Patterning Lithography Study with High Overlay Accuracy
#7640-26	Experimental Result of Polarization Characteristics Separation Method
#7640-30	Impact of Scanner Signatures on Optical Proximity Correction
#7640-32	Topcoat-less Resist Approach for High Volume Production and Yield Enhancement of Immersion Lithography
#7640-40	Simultaneous Optimization of Dose and Focus Controls in Advanced ArF Immersion Scanners
#7640-52	Illumination Optics for Source-Mask Optimization
#7640-58	Latest Performance of Immersion Scanner S620D with the Streamlign Platform for the Double Patterning Generation

SPIE Advanced Lithography 2009

#7273-160	Practical Implementation of Immersion Resist Materials
#7274-07	A Study of Source & Mask Optimization for ArF Scanners
#7274-29	Scanner-dependent Optical Proximity Effects
#7274-30	Challenges and Solutions in the Calibration of Projection Lens Pupil-Image Metrology Tools
#7274-31	Achieving Overlay Budgets for Double Patterning
#7274-54	An Innovative Platform for High-Throughput, High Accuracy Lithography Using a Single Wafer Stage
#7274-58	Polarization Aberration Control for ArF Projection Lenses
#7274-61	Control and Reduction of Immersion Defectivity for Yield Enhancement at High Volume Production

SPIE Advanced Lithography 2008

#6921-22	Nikon EUVL Development Progress Update
#6921-26	Development Status of Projection Optics and Illumination Optics for EUV1
#6922-107	A System to Optimize Mix-and-Match Overlay in Lithography
#6924-26	Double Patterning Requirements for Optical Lithography and Prospects for Optical Extension Without Double Patterning
#6924-34	Polarization Characteristics of State-of-Art Lithography Optics Reconstructed From On-Body Measurement
#6924-38	Studies of High Index Immersion Lithography
#6924-43	Immersion Defectivity Study with Volume Production Immersion Lithography Tool for 45 nm Node and Below
#6924-58	Recent Performance Results of Nikon Immersion Lithography Tools
#6924-63	An Intelligent Imaging System for ArF Scanner
#6924-66	Thermal Aberration Control in Projection Lens



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