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Overcoming the many technical and business challenges of lithography requires an active and ongoing collaboration between industry leaders. That's why Nikon continues to play a significant role at industry conferences and events.

For a complete copy of any of the Nikon papers presented during these conferences, please email us at npicom@nikon.com.

#6921-22	Nikon EUVL Development Progress Update
#6921-26	Development Status of Projection Optics and Illumination Optics for EUV1
#6922-107	A System to Optimize Mix-and-Match Overlay in Lithography
#6924-26	Double Patterning Requirements for Optical Lithography and Prospects for Optical Extension Without Double Patterning
#6924-34	Polarization Characteristics of State-of-Art Lithography Optics Reconstructed From On-Body Measurement
#6924-38	Studies of High Index Immersion Lithography
#6924-43	Immersion Defectivity Study with Volume Production Immersion Lithography Tool for 45 nm Node and Below
#6924-58	Recent Performance Results of Nikon Immersion Lithography Tools
#6924-63	An Intelligent Imaging System for ArF Scanner
#6924-66	Thermal Aberration Control in Projection Lens

#6517-06	Nikon EUVL Development Progress Update
#6517-18	Development of Optics for EUV Lithography Tools
#6517-107	Carbon Deposition on Multi-Layer Mirrors by Extreme Ultra Violet Ray Irradiation
#6518-105	Improved Overlay Control Through Automated High Order Compensation
#6519-11	Adapting Immersion Exposure to Mass Production by Adopting a Cluster of Novel Resist-Coating/Developing and Immersion - Exposure Equipment
#6519-12	Immersion Defectivity Control by Optimizing Immersion Materials and Processes
#6520-06	Current Status of High Index Immersion Lithography Development
#6520-14	Polarization Dependent Proximity Effects
#6520-42	Immersion Defectivity Study with Volume Production Immersion Lithography Tool
#6520-67	Latest Results from the Hyper-NA Immersion Scanners S609B and S610C
#6520-72	Catadioptric Projection Lens for 1.3 NA Scanner
#6520-105	Thermal Aberration Control for Low K₁ Lithography
#6520-106	Quasi-Telecentricity: the Effects of Unbalanced Multipole Illumination
#6520-118	Visualizing the Impact of the Illumination Distribution upon Imaging, and Applying the Insights Gained
#6520-135	Scanner-Characteristics-Aware OPC Modeling and Correction
#6521-45	Scanner Parameter Sensitivity Analysis for OPE

#6152-132	Aerial Image Sensor: In-Situ Scanner Aberration Monitor
#6152-150	Swing Curve Measurement and Simulation for High NA Lithography
#6152-156	Overlay Improvement by Non-linear Error Correction and Non-linear Error Control by APC
#6154-24	Characterizing a Scanner Illuminator for Prediction of OPE Effects
#6154-36	Effects of Laser Bandwidth on OPE in a Modern Lithography Tool
#6154-85	DOF Enhancement for Contact Holes by using Nikon’s CDP Option and its Introduction into Production
#6154-133	Verifying High NA Polarization OPC Treatment on Wafer
#6154-145	Application of Aberration Optimization for Specific Pattern Using Nikon’s TAO Method
#6154-149	Illumination Conditions Matching for Critical Layers Manufacturing in a Production Context
#6154-158	Advances in Imaging Tool Adjustment Optimization Methodologies and Capabilities, Including Impact upon Imaging Performance Budget Components
#6155-23	Predictive Modeling for the Management of Consumable Optics in a Lithographic System

#5752-64	Double-grating Lateral Shearing Interferometer for EUV Optics At-Wavelength Measurement
#5752-133	Experimental Comparison of Absolute PDI and Lateral Shearing Interferometer
#5754-117	Study of High NA Imaging with Polarized Illumination
#5754-18	Development of Aerial Image Based Aberration Measurement Technique
#5751-139	Apparatus for Contamination Control Development in EUVA
#5751-53	Nikon EPL Tool: The Latest Development Status Results
#5754-64	Development of Polarized-light Illuminator and its Impact