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Tokyo, Japan – November 26, 2014 – Nikon Corporation announced the NSR-S322F scanner delivering superior performance and productivity for the most challenging dry ArF layers. The S322F leverages the proven Streamlign Platform, which is already employed globally and delivering optimal cost of ownership, to satisfy aggressive dry 193 nm requirements. The successful combination of the Stream Alignment and...
April 11, 2014 – Nikon Corporation (Makoto Kimura, President) has been recognized as one of 18 companies receiving Intel Corporation’s Preferred Quality Supplier (PQS) award for their performance in 2013. This supplier has demonstrated industry-leading commitment across all critical focus areas on which they are measured: quality, cost, availability, technology, customer service, labor and ethics systems...
Belmont, California – April 1, 2014 – Mr. Thomas Novak, CEO and President of Nikon Research Corporation of American (NRCA), a subsidiary of Nikon Corporation, announced his retirement from the company. Mr. Novak is succeeded by Dr. Donis Flagello, who will assume the role of NRCA President, CEO and COO effective April 1, 2014. Tom Novak...
Tokyo, Japan – February 20, 2014 – Nikon Corporation introduces the NSR-S630D ArF immersion scanner, delivering world-class performance and productivity for 10 nm manufacturing and beyond. The S630D builds on the advanced Streamlign platform to deliver ground-breaking solutions to extend 193 nm immersion lithography. Enhancements to reticle positioning accuracy and air/thermal management provide unprecedented mix-and-match overlay (MMO) ≤ 2.5...
March 5 , 2009 – Nikon Corporation (Michio Kariya, President)  has received Intel Corporation’s prestigious Supplier Continuous Quality Improvement (SCQI) award recognizing world-class, outstanding performance in 2008. This award is Intel’s highest honor for its suppliers, acknowledging extraordinary commitment to quality and exceptional performance for providing lithography scanners for technology development and high volume manufacturing deemed...
Production Capacity Expansion for ArF Immersion Scanners August 6 , 2008 – Nikon Corporation (Michio Kariya, President) will build two new buildings, one in its Kumagaya Plant and one at its subsidiary, Tochigi Nikon Precision Co., Ltd., enhancing production capacity to meet the rapidly growing demand for its ArF immersion scanners. The Kumagaya Plant and Tochigi...
BELMONT, California, March 18, 2008 – Nikon Corporation was named a recipient of Intel Corporation’s 2007 Preferred Quality Supplier (PQS) award for outstanding performance in providing products and services deemed essential to Intel’s success. The company is awarded for its efforts supplying Intel with lithography scanners for TD and HVM. Nikon Corporation and 34 additional PQS...
Low Risk Solution for 32 nm Process Development Belmont, California – February 20, 2008 – Nikon Corporation has announced they will provide an immersion scanner for Double Patterning, based on the successful NSR-S610C platform, to their customers in the 4th quarter of 2008.  By enhancing the performance of the mature NSR-S610C ArF immersion scanner to address...
Tokyo, Japan – December 3, 2007 – Nikon Corporation (Michio Kariya, President) and KLA-Tencor, the world leader in semiconductor wafer inspection/metrology tools (President & COO John Kispert: Nasdaq GS: KLAC) today announced that they will launch Scanner Match Maker (SMM), a system for improving overlay accuracy, in the First Quarter of 2008. The SMM system successfully...
New Stepper Reduces Costs for Sub-Critical Layers Belmont, California – November 29, 2007 – Nikon continues its focus on high productivity lithography solutions with the introduction of the NSR-SF155, a scan field i-line stepper with ultra-high throughput and the lowest cost of ownership. Throughput has been increased to 200 wafers per hour or more, with overlay...
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