Overcoming the many technical and business challenges of lithography requires an active and ongoing collaboration between industry leaders. That’s why Nikon continues to play a significant role at industry conferences and events.
Nikon customers and industry partners can request copies of papers presented at industry conferences via npicom@nikon.com
SPIE Advanced Lithography 2014
| #9052-9 | Scanner performance predictor and optimizer in further low-k1 lithography |
| #9052-10 | Imaging Control Functions of Optical Scanners |
| #9049-91 | Scanner Effects on Directed Self-Assembly Patterning |
| #9052-23 | Immersion Lithography Extension to Sub-10 nm Nodes with Multiple Patterning |
| #9052-52 | Immersion Scanners Enabling 10 nm Half-pitch Production and Beyond |
SPIE Advanced Lithography 2013
| #8683-09 | Imaging Application Tools for Extremely Low-k1 ArF Immersion Lithography |
| #8683-12 | Illumination Pupilgram Control Using an Intelligent Illuminator |
| #8683-24 | Global Source Optimization for MEEF and OPE |
| #8683-26 | Mix-and-Match Overlay Performance of the NSR-S622D Immersion Scanner |
| #8683-53 | Comprehensive Thermal Aberration & Distortion Control of Lithographi Lenses for Accurate Overlay |
| #8683-55 | High-Productivity Immersion Scanner Enabling 1x nm hp Manufacturing |
SPIE Advanced Lithography 2012
| #8322-40 | Development of EUV Lithography Tool Technologies in Nikon |
| #8326-3 | Spacer Process and Alignment Assessment for SADP Process |
| #8326-20 | Application of Illumination Pupilgram Control Method with Freeform Illumination |
| #8326-23 | Imaging Optics Setup and Optimization on Scanner for SMO Generation Process |
| #8326-26 | Process Window Control Using CDU Master |
| #8326-27 | The Development of a Fast Physical Photoresist Model for OPE and SMO Applications from an Optical Engineering Perspective |
| #8326-29 | High Overlay Accuracy for Double Patterning Using an Immersion Scanner |
| #8326-47 | Finite Element Models of Lithographic Mask Topography |
| #8326-53 | Immersion and Dry ArF Scanners Enabling 22 nm hp Production and Beyond |
SPIE Advanced Lithography 2011
| #7969-21 | A Simple Modeling of Carbon Contamination on EUV Exposure Tools Based on Contamination Experiments with Synchrotron Source |
| #7969-23 | Development of EUV Lithography Tools in Nikon |
| #7973-17 | Scanner Alignment Performance for Double Patterning |
| #7973-31 | An Aberration Control of Projection Optics for Multi-patterning Lithography |
| #7973-34 | Stability and Calibration of Overlay and Focus Control for a Double Patterning Immersion Scanner |
| #7973-35 | Advanced CDU Control for 22 nm and Below |
| #7973-50 | Practical Performance and Enabling Technologies in Immersion Scanners for Double Patterning Generation |
| #7973-52 | Pupilgram Adjusting Scheme Using Intelligent Illuminator for ArF Immersion Exposure Tool |
| #7973-71 | A Simple Method of Source Optimization for Advanced NAND FLASH Process |
SPIE Advanced Lithography 2010
| #7636-67 | Contamination Study on EUV Exposure Tools Using SAGA Light Source |
| #7636-81 | Flare Modeling and Calculation for EUV Optics |
| #7638-122 | Electrical Effects of Corner Serif OPC |
| #7640-06 | Tolerancing Analysis of Customized Illumination for Practical Applications of Source & Mask Optimization |
| #7640-09 | Actual Performance Data Analysis of Overlay, Focus and Dose Control of an Immersion Scanner for DP |
| #7640-16 | Double Patterning Lithography Study with High Overlay Accuracy |
| #7640-26 | Experimental Result of Polarization Characteristics Separation Method |
| #7640-30 | Impact of Scanner Signatures on Optical Proximity Correction |
| #7640-32 | Topcoat-less Resist Approach for High Volume Production and Yield Enhancement of Immersion Lithography |
| #7640-40 | Simultaneous Optimization of Dose and Focus Controls in Advanced ArF Immersion Scanners |
| #7640-52 | Illumination Optics for Source-Mask Optimization |
| #7640-58 | Latest Performance of Immersion Scanner S620D with the Streamlign Platform for the Double Patterning Generation |
SPIE Advanced Lithography 2009
| #7273-160 | Practical Implementation of Immersion Resist Materials |
| #7274-07 | A Study of Source & Mask Optimization for ArF Scanners |
| #7274-29 | Scanner-dependent Optical Proximity Effects |
| #7274-30 | Challenges and Solutions in the Calibration of Projection Lens Pupil-Image Metrology Tools |
| #7274-31 | Achieving Overlay Budgets for Double Patterning |
| #7274-54 | An Innovative Platform for High-Throughput, High Accuracy Lithography Using a Single Wafer Stage |
| #7274-58 | Polarization Aberration Control for ArF Projection Lenses |
| #7274-61 | Control and Reduction of Immersion Defectivity for Yield Enhancement at High Volume Production |
SPIE Advanced Lithography 2008
| #6921-22 | Nikon EUVL Development Progress Update |
| #6921-26 | Development Status of Projection Optics and Illumination Optics for EUV1 |
| #6922-107 | A System to Optimize Mix-and-Match Overlay in Lithography |
| #6924-26 | Double Patterning Requirements for Optical Lithography and Prospects for Optical Extension Without Double Patterning |
| #6924-34 | Polarization Characteristics of State-of-Art Lithography Optics Reconstructed From On-Body Measurement |
| #6924-38 | Studies of High Index Immersion Lithography |
| #6924-43 | Immersion Defectivity Study with Volume Production Immersion Lithography Tool for 45 nm Node and Below |
| #6924-58 | Recent Performance Results of Nikon Immersion Lithography Tools |
| #6924-63 | An Intelligent Imaging System for ArF Scanner |
| #6924-66 | Thermal Aberration Control in Projection Lens |