Tokyo, Japan – February 20, 2013 – Nikon Corporation has announced release of the NSR-S622D ArF immersion scanner to deliver world-class overlay and ultra-high productivity for the most demanding multiple patterning applications. The S622D is the latest evolution of the Streamlign Platform, which is already employed globally for NSR-S620/S621D immersion scanners, and in the leading-edge NSR-S320F dry ArF scanner. The proven Bird’s Eye control system is combined with enhancements to scanner autofocus and lens performance to enable mix-and-match overlay (MMO) accuracy ≤ 3.5 nm in order to satisfy the most challenging immersion multiple patterning requirements. In addition, the established Stream Alignment and Five-Eye FIA systems enable ultra-high throughput of 200 wafers per hour (125 exposure shots/wafer) to maximize scanner productivity.
The semiconductor industry is transitioning to development and high volume manufacturing of sub-20 nm generation process devices, with the most critical layers exposed using ArF immersion scanners and incorporating multiple patterning. In order to minimize costs for IC makers, exceptional scanner overlay matching capabilities are vital to ensuring high yield and optimal productivity. The S622D builds upon the well-known Streamlign Platform, incorporating further projection lens and autofocus system developments to deliver world-class mix-and-match overlay and ultra-high throughput. The NSR-S622D is the most advanced scanner for high volume immersion applications, and fully satisfies aggressive sub-20 nm multiple patterning requirements.
With a consistent focus on technology solutions to enable next generation lithography, Nikon continues to introduce new scanners to market that satisfy device makers’ increasingly challenging performance and productivity requirements. “Nikon Streamlign platform-based immersion and dry ArF scanners have gained strong worldwide market acceptance. The NSR-S622D is the latest evolution of this proven technology, and delivers unprecedented overlay performance and ultra-high throughput, which are essential for cost-effective, leading-edge multiple patterning applications,” stated Hamid Zarringhalam, Executive Vice President of Nikon Precision Inc.
Since 1980, Nikon Corporation has been revolutionizing lithography with innovative products and technologies. The company is a worldwide leader in lithography equipment for the microelectronics manufacturing industry with more than 8,000 exposure systems installed worldwide. Nikon offers the most extensive selection of production-class steppers and scanners in the industry. These products serve the semiconductor, flat panel display (LCD) and thin-film magnetic head (TFH) industries. Nikon Precision Inc. provides service, training, applications and technical support, as well as sales and marketing for Nikon lithography equipment in North America. For more information about Nikon, access our website at http://www.nikonprecision.com.
This press release contains forward-looking statements as that term is defined in the Private Securities Reform Act of 1995, which are subject to known and unknown risks and uncertainties that could cause actual results to differ materially from those expressed or implied by such statements. Such statements are subject to risks, uncertainties and changes in condition, particularly those related to industry requirements and other risks. The Company undertakes no obligation to update the information in this press release.
For further information, contact:
Holly Magoon, Senior Marketing Manager
Nikon Precision Inc.