Tokyo, Japan – February 1, 2012 – Nikon Corporation announced that the NSR-S621D ArF immersion scanner began shipping to IC manufacturers in January to deliver ultra-high productivity and superior overlay accuracy for the most demanding immersion double patterning layers. The S621D is the latest evolution of the Streamlign Platform, which is already employed globally for NSR-S620D immersion scanners, and was also recently integrated in the leading-edge NSR-S320F dry ArF scanner. The successful combination of Stream Alignment and Five-Eye FIA systems enables world-class throughput of 200 wafers per hour (125 exposure shots/wafer). In addition, the proven Bird’s Eye Control system uses interferometers in conjunction with encoders to deliver overlay accuracy ≤ 2 nm with optimal stability, while the mature Modular2 Structure simplifies installation and maintenance functions.
The semiconductor industry is currently transitioning to development and high volume manufacturing of 20 nm generation process devices, with the most critical layers exposed using ArF immersion scanners and incorporating double patterning (DP). In order to minimize costs, productivity and yield are of vital importance to IC makers. The S621D builds upon the established Streamlign Platform, incorporating further hardware and software developments to deliver industry-leading overlay accuracy and throughput. The NSR-S621D is the most advanced scanner for high volume immersion applications, and fully satisfies the aggressive requirements of DP manufacturing.
With a consistent focus on technology innovations to enable next generation lithography, Nikon continues to introduce new scanners to market that satisfy increasingly challenging performance and productivity requirements. “Lithography solutions that deliver ultra-high productivity and exceptional overlay accuracy are imperative to making double patterning cost effective. Our Streamlign Platform-based immersion and dry ArF scanners continue to gain worldwide market acceptance and the NSR-S621D is the latest evolution of this proven Nikon technology,” stated Hamid Zarringhalam, Executive Vice President of Nikon Precision Inc.
Since 1980, Nikon Corporation has been revolutionizing lithography with innovative products and technologies. The company is a worldwide leader in lithography equipment for the microelectronics manufacturing industry with more than 8,000 exposure systems installed worldwide. Nikon offers the most extensive selection of production-class steppers and scanners in the industry. These products serve the semiconductor, flat panel display (LCD) and thin-film magnetic head (TFH) industries. Nikon Precision Inc. provides service, training, applications and technical support, as well as sales and marketing for Nikon lithography equipment in North America. For more information about Nikon, access our website at http://nikonprecision.wpengine.com.
This press release contains forward-looking statements as that term is defined in the Private Securities Reform Act of 1995, which are subject to known and unknown risks and uncertainties that could cause actual results to differ materially from those expressed or implied by such statements. Such statements are subject to risks, uncertainties and changes in condition, particularly those related to industry requirements and other risks. The Company undertakes no obligation to update the information in this press release.
For further information, contact:
Holly Magoon, Marketing Manager
Nikon Precision Inc.