Nikon understands that it is real-world, on-product performance and productivity that are vital to chipmakers. We have developed two revolutionary products specifically focused on optimizing alignment in order to enable cost-effective lithography scaling.
The newly released inline Alignment Station (iAS) is a high speed, extremely accurate wafer pre-measurement module that can be integrated between the coater/developer and the NSR-S631E immersion scanner. iAS provides feed forward alignment results for all shots on every wafer, delivering better alignment and overlay—with no impact on throughput. iAS capabilities can be extended to other scanners in the fab with the LithoBooster Standalone Alignment Station. In addition to delivering wafer-by-wafer feed forward corrections, LithoBooster also provides an open platform for expanded overlay, autofocus, and process control solutions.
iAS and LithoBooster enable chipmakers to meet the ever-tightening overlay and edge placement error (EPE) requirements for leading-edge semiconductor manufacturing.
inline Alignment Station (iAS)
Delivers world-class device patterning and productivity for 7 nm node applications and beyond
LithoBooster Standalone Alignment Station
Maximizes productivity and yield with Standalone Alignment Station