Simple, quick setup stepper for ABS processing and more
The user-friendly NES1W-h02 system is a basic stepper that provides quick system setup and startup times, with installations able to be completed in under 5 days.  It satisfies the critical resolution and overlay requirements in Air Bearing Surface (ABS) fabrication for magnetic heads, while delivering 70 (3”) wafers per hour, and accommodates substrates up to 150 mm in diameter. While the majority of these steppers are employed in ABS applications, many are also utilized in MEMS manufacturing as well as research/development work.  

Delivers excellent imaging and low cost of ownership
The NES1W-h02 stepper utilizes a projection lens design to fully satisfy customers’ imaging requirements at the lowest cost of ownership. This design eliminates costly issues with mask contamination or defectivity that can result from contact or proximity methods historically used. The 0.16 NA lens delivers 5x reduction to enable resolution down to 2.5 µm with a wide 12 µm depth of focus, and die-by-die autofocus maximizes stepper yield by compensating for problematic process deviations and wafer warpage, etc.

Off-axis alignment and EGA enable 1.0 µm* overlay capabilities and beyond
The NES1W-h02 Mini Stepper was the first model to employ off-axis wafer alignment. This design eliminated chromatic aberration issues, and improved distortion as well as alignment performance. EGA is also utilized to ensure best fit alignment and enable 1.0 µm overlay accuracy. (*Overlay performance can be enhanced to 0.3 µm with the optional Environmental Chamber). Pattern Matching Alignment capabilities are also supported if traditional alignment marks cannot be included in the customer’s layout.

  • Wavelength (nm)
  • Lens-NA 0.16
  • Exposure Area (mm)
  • Reduction Ratio
  • Resolution (µm)
  • Depth of Focus (µm)
  • Overlay Accuracy (µm)
  • Throughput
  • Wafer Size (mm)
  • 405
  • 0.16
  • 11 mm circle
  • 1/5
  • 2.5
  • 12.0
  • 1.0 (or 0.30 with optional Environmental Chamber)
  • 3": 70 WPH
  • ≤ = 150

NES1W-h02 Imaging Capabilities with 0.16 NA


NES1 and NES2 systems can also reduce metrology costs with overlay accuracy able to be measured by the Mini Steppers themselves using the optional Standard Reticle for Calibration Package.