Preparing for future lithography needs is a top priority at Nikon, and we recognize that enhancing semiconductor performance and enabling cost reduction requires endless innovation. As chipmakers search for optimal methods for producing next-generation devices, Nikon is developing several advanced approaches in parallel. This will ensure that the right production tools are available when they are needed.
Double Exposure/Double Patterning and Multiple Patterning
Nikon has been aggressively engaged in double and multiple patterning development for many years. In 2009, Nikon began shipping the NSR-S620 immersion scanner. Nikon developed the S620D (NA = 1.35), based on the pioneering Streamlign platform, to enable double patterning lithography at 32 nm and provide extendibility to next-generation applications. This was followed by the evolutionary NSR-S621D, S622D, and S630D immersion scanners for applications down to the 10 nm node and beyond. Nikon launched the NSR-S631E ArF immersion scanner in 2016. The S631E ensures world-class device patterning and optimum fab productivity to fully satisfy real-world 7 nm node requirements.
Nikon. Delivering Real-world Solutions.