Nikon Precision

Nikon Precision | USA & Europe

Global Site

Nikon Precision | USA & Europe

 

  • Home
  • About Us
    • Corporate Profile
    • Management Team
    • News and Events
      • Press Releases
        • Press Release Archives
      • Conference Papers
    • Industry Overview from SEMI
    • Careers U.S.
      • Openings
    • Careers Europe
      • Openings
    • Contact Us
      • Driving Directions U.S.
      • Driving Directions Europe
  • Products and Technology
    • Immersion and Multiple Patterning
      • NSR-S635E
      • NSR-S622D
    • Deep UV
      • NSR-S322F
      • NSR-S220D
    • i-Line
      • NSR-SF155
    • Alignment Stations
      • Litho Booster
    • Semiconductor Inspection Systems
      • OPTISTATION-3000 Series
      • AMI-3500/5600 Systems
      • Illumination Systems
    • Steppers and Metrology Solutions for MEMS Markets
      • NES1W-i04
      • NES1W-i05 • NES2W-i05
      • NES1W-ghi06
        NES2W-ghi06
      • NES1W-i06
        NES2W-i06
      • NES2W-i10
      • Both Side Measurement (BSM) Systems
        • BSM-200
    • Refurbished Equipment
      • Used Equipment & Programs Inquiry
    • Options, Upgrades and Modifications
      • Options and Upgrades
        • Upgrade Inquiry
      • Hardware Modifications and Components
        • Hardware Modification and Component Inquiry
  • Support and Training
    • Service and Support
      • Programs
      • Parts
      • Installation
      • Applications
    • Customer Support Europe
    • Training Programs

Nikon Corporation Receives Intel’s Prestigious Supplier Continuous Quality Improvement Award

March 5, 2009

March 5 , 2009 – Nikon Corporation (Michio Kariya, President)  has received Intel Corporation’s prestigious Supplier Continuous Quality Improvement (SCQI) award recognizing world-class, outstanding performance in 2008. This award is Intel’s highest honor for its suppliers, acknowledging extraordinary commitment to quality and exceptional performance for providing lithography scanners for technology development and high volume manufacturing […]

Filed Under: Press Releases Tagged With: archive

Nikon Corporation to Build Two New Buildings for Production of IC Steppers and Scanners

August 6, 2008

Production Capacity Expansion for ArF Immersion Scanners August 6 , 2008 – Nikon Corporation (Michio Kariya, President) will build two new buildings, one in its Kumagaya Plant and one at its subsidiary, Tochigi Nikon Precision Co., Ltd., enhancing production capacity to meet the rapidly growing demand for its ArF immersion scanners. The Kumagaya Plant and […]

Filed Under: Press Releases Tagged With: archive

Nikon Corporation Receives Intel’s Preferred Quality Supplier Award

March 18, 2008

BELMONT, California, March 18, 2008 – Nikon Corporation was named a recipient of Intel Corporation’s 2007 Preferred Quality Supplier (PQS) award for outstanding performance in providing products and services deemed essential to Intel’s success. The company is awarded for its efforts supplying Intel with lithography scanners for TD and HVM. Nikon Corporation and 34 additional […]

Filed Under: Press Releases Tagged With: archive

Nikon Announces ArF immersion Scanner for Double Patterning

February 20, 2008

Low Risk Solution for 32 nm Process Development Belmont, California – February 20, 2008 – Nikon Corporation has announced they will provide an immersion scanner for Double Patterning, based on the successful NSR-S610C platform, to their customers in the 4th quarter of 2008.  By enhancing the performance of the mature NSR-S610C ArF immersion scanner to […]

Filed Under: Press Releases Tagged With: archive

Nikon and KLA-Tencor Announce New Overlay Solution

December 3, 2007

Tokyo, Japan – December 3, 2007 – Nikon Corporation (Michio Kariya, President) and KLA-Tencor, the world leader in semiconductor wafer inspection/metrology tools (President & COO John Kispert: Nasdaq GS: KLAC) today announced that they will launch Scanner Match Maker (SMM), a system for improving overlay accuracy, in the First Quarter of 2008. The SMM system […]

Filed Under: Press Releases Tagged With: archive

Nikon Completes Shipment of Immersion Scanners to All Major Semiconductor Manufacturing Regions of the World

November 29, 2007

Belmont, California – November 29, 2007 – Nikon Corporation has completed shipment of its NSR-S610C ArF immersion scanners to all of the five major regions of the world where leading-edge devices are manufactured. These areas include Japan, Taiwan, Korea, North America, and Europe. Immersion customers include memory and logic manufacturers, consisting of both existing Nikon […]

Filed Under: Press Releases Tagged With: archive

Nikon Announces High Throughput i-line Stepper

November 29, 2007

New Stepper Reduces Costs for Sub-Critical Layers Belmont, California – November 29, 2007 – Nikon continues its focus on high productivity lithography solutions with the introduction of the NSR-SF155, a scan field i-line stepper with ultra-high throughput and the lowest cost of ownership. Throughput has been increased to 200 wafers per hour or more, with […]

Filed Under: Press Releases Tagged With: archive

Nikon NSR-S610C to be Used for Production of 43 nm NAND Flash

October 18, 2007

Belmont, California – October 18, 2007 – At the 4th International Symposium on Immersion Lithography held in Keystone, Colorado last week, Nikon Corporation and Toshiba Corporation announced 43 nm NAND Flash production would begin using the Nikon NSR-S610C ArF immersion scanner. The NSR-S610C (NA = 1.30), the world’s first 45 nm-capable immersion scanner, is targeted […]

Filed Under: Press Releases Tagged With: archive

Nikon and Synopsys Announce Manufacturing-Aware DFM Solution for 45 nm and Below

September 18, 2007

Embedded Scanner Parameter Module Delivers Improved OPC Accuracy, Enhanced Model Predictability and Reduced Time to Silicon for Mutual Customers Belmont, Calif. and Mountain View, Calif. – September 18, 2007 – Nikon Corporation, a leading supplier of lithography equipment for microelectronics manufacturing, and Synopsys, Inc. (Nasdaq: SNPS), a world leader in semiconductor design and manufacturing software, […]

Filed Under: Press Releases Tagged With: archive

Nikon Announces New ArF and KrF Scanners with 20% Higher Productivity

July 11, 2007

Nikon completes new suite of lithography solutions with two new scanners Belmont, California – July 11, 2007 – With a focus on leading-edge technology and high productivity, Nikon continues to introduce new lithography solutions to market at a rapid pace with two new DUV scanners – the NSR-S310F ArF scanner and the NSR-S210D KrF scanner. […]

Filed Under: Press Releases Tagged With: archive

Next Page »

About Us

  • Corporate Profile
  • Management Team
  • News and Events
    • Press Releases
    • Conference Papers
  • Industry Overview from SEMI
  • Careers at Nikon USA
    • Openings
  • Careers at Nikon Precision Europe
    • Openings
  • Contact Us

NIKON PRECISION INC.
NIKON PRECISION EUROPE GMBH


  • Site Map
  • Contact
  • US Privacy
  • EU Privacy
  • UK Tax Strategy
  • Terms of Use

© 2021 Nikon Precision Inc. / Nikon Precision Europe GmbH