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Nikon Ships World’s First 45 nm Production Immersion Scanner

February 28, 2007

Belmont, California – February 28, 2007 – Nikon Corporation has shipped the world’s first immersion lithography system capable of 45 nm production. The NSR-S610C, an ArF immersion scanner with the industry’s highest projection lens NA of 1.30, shipped to a major IC manufacturer. The system is targeted for mass production of 45 nm devices and […]

Filed Under: Press Releases Tagged With: archive

Nikon and CEA-Leti Announce Partnership for Double Patterning and Double Exposure Technology

February 27, 2007

Belmont, California – February 27, 2007 – Nikon Corporation announced today a Joint Development Program with CEA-Leti, one of Europe’s leading microelectronics research centers focused on optical lithography development for technology beyond 45 nm. The work will examine the potential of Double Exposure and Double Patterning for 32 nm semiconductor devices, and will utilize a […]

Filed Under: Press Releases Tagged With: archive

Powerchip Orders Nikon Immersion Scanner for Next-Generation Memory Line

December 14, 2006

Major Taiwanese Memory Manufacturer Selects Nikon BELMONT, California — December 14, 2006 — Nikon Precision announced its NSR-S610C ArF immersion scanner has been selected by Powerchip Semiconductor Corporation as the leading edge tool for its 50 nm NAND flash process. The tool will be installed in Powerchip’s fab in Hsinchu, Taiwan. This system was selected […]

Filed Under: Press Releases Tagged With: archive

Nikon Announces New Ultra High Throughput Stepper

November 20, 2006

New Stepper Reduces Costs for Sub-Critical Layers BELMONT, California — November 20, 2006 — Nikon continues its focus on high productivity lithography solutions with the introduction of the NSR-SF150, a scan field i-line stepper with ultra high throughput and extremely low cost of ownership. Throughput has been increased by more than 50% to 180 wafers […]

Filed Under: Press Releases Tagged With: archive

Nikon and Brion Partner to Deliver Optimized DFM Lithography Solutions

October 10, 2006

Improved OPC model accuracy and reduced time to market are key benefits BELMONT, California., October 10, 2006 — Nikon Corporation, a leading supplier of lithography equipment for microelectronics manufacturing, and Brion Technologies Inc., the leader in Lithography-Driven Design & Manufacturing™, today announced a partnership to deliver lithography enabled DFM applications aimed at providing globally optimized […]

Filed Under: Press Releases Tagged With: archive

Nikon and Synopsys Collaborate to Deliver Advanced DFM Lithography Solutions for 45nm and Below

September 6, 2006

Solutions target improved lithography modeling accuracy, reduced time to silicon, and improved manufacturing yield BELMONT, Calif., – September 20, 2006 – Nikon Corporation, a leading supplier of lithography equipment for microelectronics manufacturing, and Synopsys, Inc. (Nasdaq:SNPS), a world leader in semiconductor design software today announced that they are collaborating on the development and delivery of […]

Filed Under: Press Releases Tagged With: archive

Nikon Announces World’s First Scanner for 45 nm Volume Production

July 6, 2006

Immersion system with 1.30 NA lens will ship by end of 2006 Belmont, California, July 6, 2006 – Nikon Corporation has developed the world’s first lithography system designed to meet the semiconductor industry’s requirements for mass production of 45 nm memory and of 32 nm logic devices. The NSR-S610C, an ArF immersion scanner, includes an […]

Filed Under: Press Releases Tagged With: archive

Nikon Ships World’s First Production Immersion System

February 16, 2006

Major IC Manufacturer Selects Nikon for 55 nm Production Belmont, California, February 16, 2006 – Nikon Corporation has shipped the world’s first production immersion lithography system. The NSR-S609B, an ArF immersion scanner with the industry’s first hyper-NA projection lens of NA 1.07, shipped in January to a major IC manufacturer. The system is targeted for […]

Filed Under: Press Releases Tagged With: archive

Nikon Reduces Cost of Ownership with New System

July 7, 2005

High Throughput Stepper Reduces Costs for Non Critical Layers Belmont, California, July 7, 2005 – Nikon continues its focus on high productivity lithography solutions with the introduction of the NSR-SF140, a scan-field i-line stepper with high throughput and extremely low cost of ownership. The system makes use of leading-edge lens technology to achieve the same […]

Filed Under: Press Releases Tagged With: archive

Nikon Announces the World’s First Hyper NA Immersion System

June 30, 2005

New Tandem Stage system enables 45 nm process development Belmont, California – June 30, 2005 – Nikon Corporation has developed the world’s first lithography system with a hyper NA lens. The NSR-S609B, an ArF immersion scanner with the industry’s highest NA projection lens of 1.07, is targeted at mass production of 55 nm and development […]

Filed Under: Press Releases Tagged With: archive

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