High Throughput Stepper Mix-and-Matches to DUV Scanners
Belmont, Calif., July 8, 2003 – To help address the need for lower manufacturing costs for advanced integrated circuits, Nikon Corporation today introduced the first KrF scan-field stepper – the NSR-SF200. The system makes use of leading-edge lens technology to achieve the same wide exposure field (26×33 mm) as an ArF scanner, making it easy for mix and match applications. Customers can use the NSR-SF200 for sub-critical layers in mass production of 90nm devices. Operating costs and total cost of ownership are reduced by 50% versus KrF scanners.
With the same reduction ratio and field size as Nikon’s DUV scanners, the scan-field stepper is ideal for exposing sub-critical layers, which can comprise roughly half of the more than 20 layers required to build a device. The NSR-SF200 achieves a resolution of 150 nm or better and boasts a throughput of 110 wafers/hour for 300 mm wafers. The system combines superior performance with the lowest low cost of ownership to help reduce semiconductor manufacturing costs.
In 2001, Nikon was the first in the industry to develop a new-concept stepper specifically for mix-and-match with DUV scanners, when it introduced the NSR-SF100 an i-line stepper with wide exposure field. In 2002, Nikon introduced the NSR-SF120, which featured lower resolution and high throughput. To build on the success of the NSR-SF100 and 120, Nikon has introduced the first KrF scan-field stepper.
“Our customers are struggling to reduce their manufacturing costs to be more competitive. The NSR-SF200 provides them with significant cost of ownership savings”, stated Geoff Wild, CEO of Nikon Precision, Inc. “Our customers recognize the price-to-performance value of our scan-field products, since 2001 we’ve shipped more than 120 of these systems worldwide”.
Nikon will begin shipping systems after November of this year.
Since 1980, Nikon Corporation has been revolutionizing lithography with innovative products and technologies. The company is a worldwide leader in lithography equipment for the microelectronics manufacturing industry with more than 7,200 exposure systems installed worldwide. Nikon offers the most extensive selection of production-class steppers and scanners in the industry. These products serve the semiconductor, flat panel display (LCD) and thin-film magnetic head (TFH) industries. Nikon Precision Inc. provides service, training, applications and technical support, as well as sales and marketing for Nikon lithography equipment in North America.
This press release contains forward-looking statements as that term is defined in the Private Securities Reform Act of 1995, which are subject to known and unknown risks and uncertainties that could cause actual results to differ materially from those expressed or implied by such statements. Such statements are subject to risks, uncertainties and changes in condition, particularly those related to industry requirements and other risks. The Company undertakes no obligation to update the information in this press release.
Director of Marketing
Nikon Precision Inc.,
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