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The NSR-S620D
Enabling the Next Generation

The NSR-S620D was designed to meet the stringent overlay, throughput, and availability requirements for 32 nm double patterning, and provide extendibility to 22 nm applications. With the NSR-S620D, Nikon is once again enabling the next generation of IC manufacturing.

Learn More About the NSR-S620D
Learn More About the S620D Streamlign platform

NSR-S320F
Ultra-high productivity scanner for the most critical dry ArF applications		  
NSR-S210D
A high productivity KrF scanner for subcritical layers		  
NSR-SF155
The most cost-effective solution for subcritical layers

Nikon Satisfies Unique Requirements of MEMS, LEDs, and More with Mini Steppers - NEW
Nikon Announces New Dry ArF Scanner Delivering World-Class Overlay and Productivity
Nikon Supports SEMI HTU in Helping Students Recognize Rewarding Science-Based Careers
Nikon Receives Intel's Preferred Quality Supplier Award
Nikon Receives Intel's Prestigious Supplier Continuous Quality Improvement Award
Nikon Corporation to Build Two New Buildings for Production of IC Steppers and Scanners

 

 
 





 


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