Nikon continues to expand a vast portfolio of lithography systems to deliver maximized productivity, superior technology, and low cost of ownership for chipmakers. The diverse needs of today’s semiconductor manufacturers are met with the NSR-SF155 i-line wide-field stepper coupled with ultra-high productivity NSR-S322F and NSR-S220D scanners that are used to satisfy the aggressive requirements of advanced dry ArF and KrF processes.
The most demanding process layers require immersion technology and incorporate multiple patterning. The industry-leading NSR-S635E immersion scanner ensures world-class device patterning and optimum fab productivity to fully satisfy real-world 5 nm node requirements. It is integrated with the pioneering inline Alignment Station (iAS). iAS capabilities can be extended to other scanners in the fab with the LithoBooster Standalone Alignment Station. In addition to delivering shot-by-shot feed forward corrections, LithoBooster provides an open platform for expanded overlay, autofocus, and process control solutions as well. Nikon also offers a line-up of advanced semiconductor inspection equipment including OPTISTATION and Automated Macro Inspection (AMI) systems.
Nikon has also been actively developing lithography and metrology solutions for MEMS, LED, and packaging applications. The specialized MEMS lithography solutions deliver maximum stepper yield at the lowest possible cost. They deliver large depth of focus and backside alignment capabilities that are vital in these growing markets.
Nikon. Delivering Real-world Solutions.
Immersion and Multiple Patterning
Over the past decade we have maintained an aggressive roadmap delivering innovative scanner solutions to satisfy the increasingly stringent requirements for immersion and multiple patterning applications.
Deep UV scanners play an essential role in semiconductor manufacturing, and Nikon provides a variety of solutions to meet chip makers’ diverse production requirements.
Nikon i-Line systems deliver the superior performance and cost advantage you expect from the world’s lithography leader. Our i-Line solutions provide optimal resolution and overlay with the lowest cost of ownership (CoO).
Standalone Alignment Station delivering shot-by-shot feed forward corrections to maximize yield.
Semiconductor Inspection Systems
Nikon offers a suite of After Develop (AD) and After Etch (AE) inspection solutions
Steppers and Metrology Solutions for MEMS Markets
Nikon continues to expand the MEMS product line to satisfy the unique photolithography requirements of Air Bearing Surface (ABS) fabrication for magnetic heads, MEMS and LEDS, as well as optoelectronics, discrete semiconductors and crystal oscillator manufacturing. Nikon expanded its product offerings to also include Both Side Measurement (BSM) Systems that provide dual-side overlay metrology for MEMS applications and more.