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Products and Technology

photo_prod_techNikon continues to expand a vast portfolio of lithography systems to deliver maximized productivity, superior technology, and low cost of ownership for chipmakers. The diverse needs of today’s semiconductor manufacturers are met with the NSR-SF155 i-line wide-field stepper, coupled with ultra-high productivity NSR-S322F and NSR-S220D scanners that are used to satisfy the aggressive requirements of advanced dry ArF and KrF processes.

The most demanding process layers require immersion technology and incorporate multiple patterning. The industry-leading NSR-S635E immersion scanner ensures world-class device patterning and optimum fab productivity to fully satisfy real-world 5 nm node requirements. It is integrated with the pioneering inline Alignment Station (iAS). iAS capabilities can be extended to other scanners in the fab with the Litho Booster Standalone Alignment Station. In addition to delivering shot-by-shot feed forward corrections, Litho Booster provides an open platform for expanded overlay, autofocus, and process control solutions. Nikon also offers a line-up of advanced semiconductor inspection equipment including OPTISTATION and Automated Macro Inspection (AMI) systems, as well as specialized illumination systems for image sensor inspection.

Nikon has also specially developed lithography and metrology solutions for MEMS, LED, and packaging applications. These MEMS lithography solutions deliver maximum stepper yield at the lowest possible cost. They deliver large depth of focus and backside alignment capabilities that are vital in these growing markets.

Nikon. Delivering Real-world Solutions.

Immersion and Multiple Patterning

Over the past decade we have maintained an aggressive roadmap delivering innovative scanner solutions to satisfy the increasingly stringent requirements for immersion and multiple patterning applications.

Learn more about Immersion and Multiple Patterning

Deep UV

Deep UV scanners play an essential role in semiconductor manufacturing, and Nikon provides a variety of solutions to meet chip makers’ diverse production requirements.

Learn more about Deep UV

i-Line

Nikon i-Line systems deliver the superior performance and cost advantage you expect from the world’s lithography leader. Our i-Line solutions provide optimal resolution and overlay with the lowest cost of ownership (CoO).

Learn more about i-Line

Alignment Stations

Standalone Alignment Station delivering shot-by-shot feed forward corrections to maximize yield.

Learn more about Litho Booster

Semiconductor Inspection Systems

Semiconductor Inspection Systems

Nikon offers a suite of After Develop (AD) and After Etch (AE) inspection solutions and specialized illumination systems for image sensor inspection

Learn more about Inspection Systems

MEMS Stepper product line

Steppers and Metrology Solutions for MEMS Markets

Nikon continues to expand the MEMS product line to satisfy the unique photolithography requirements of Air Bearing Surface (ABS) fabrication for magnetic heads, MEMS and LEDS, as well as optoelectronics, discrete semiconductors and crystal oscillator manufacturing. Nikon expanded its product offerings to also include Both Side Measurement (BSM) Systems that provide dual-side overlay metrology for MEMS applications and more.

Learn more about MEMS Steppers and Metrology

 

 

 

Products and Technology

  • Immersion and Multiple Patterning
  • Deep UV
  • i-Line
  • Alignment Stations
  • Semiconductor Inspection Systems
  • Steppers and Metrology Solutions for MEMS Markets
  • Refurbished Equipment
  • Options, Upgrades and Modifications

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NIKON PRECISION EUROPE GMBH


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