Nikon continues to expand a vast portfolio of lithography systems to deliver maximized productivity, superior technology, and low cost of ownership for chipmakers. The diverse needs of today’s semiconductor manufacturers are met with the NSR-SF155 i-line wide-field stepper coupled with ultra-high productivity NSR-S322F and NSR-S220D scanners that are used to satisfy the aggressive requirements of advanced dry ArF and KrF processes.
The most demanding process layers require immersion technology and incorporate multiple patterning. The industry-leading NSR-S635E immersion scanner ensures world-class device patterning and optimum fab productivity to fully satisfy real-world 5 nm node requirements. The pioneering inline Alignment Station (iAS) is a high speed, extremely accurate wafer pre-measurement module that is integrated between the coater/developer and NSR-S631E/S635E immersion scanners. iAS capabilities can be extended to other scanners in the fab with the LithoBooster Standalone Alignment Station. In addition to delivering shot-by-shot feed forward corrections, LithoBooster provides an open platform for expanded overlay, autofocus, and process control solutions as well.
Nikon has also been actively developing lithography solutions for MEMS, LED, and packaging applications. These specialized Nikon lithography solutions deliver maximum stepper yield at the lowest possible cost. They deliver large depth of focus and backside alignment capabilities that are vital in these growing markets.
Nikon. Delivering Real-world Solutions.
Immersion and Multiple Patterning
Over the past decade we have maintained an aggressive roadmap delivering innovative scanner solutions to satisfy the increasingly stringent requirements for immersion and multiple patterning applications.
Deep UV scanners play an essential role in semiconductor manufacturing, and Nikon provides a variety of solutions to meet chip makers’ diverse production requirements.
Nikon i-Line systems deliver the superior performance and cost advantage you expect from the world's lithography leader. Our i-Line solutions provide optimal resolution and overlay with the lowest cost of ownership (CoO).
Nikon developed two revolutionary products specifically focused on optimizing alignment in order to enable cost-effective lithography scaling.
Steppers and Metrology Solutions for MEMS Markets
Nikon continues to expand the MEMS product line to satisfy the unique photolithography requirements of Air Bearing Surface (ABS) fabrication for magnetic heads, Micro Electro Mechanical Systems (MEMS) and Light Emitting Diodes (LED), as well as optoelectronics, discrete semiconductors and crystal oscillator manufacturing. These specialized Nikon lithography solutions deliver maximum stepper yield at the lowest possible cost.