Nikon continues to expand a vast portfolio of lithography systems to deliver maximized productivity, superior technology, and low cost of ownership for chipmakers. The diverse needs of today’s semiconductor manufacturers are met with the NSR-SF155 i-line wide-field stepper, as well as cost-efficient NSR-S210D KrF and NSR-S310F ArF scanners. In addition, Nikon offers the advanced NSR-S320F and ultra-high productivity NSR-S322F systems to satisfy the needs of challenging dry ArF processes.
The most demanding process layers require immersion technology and incorporate multiple patterning. Nikon developed the NSR-S620D to enable double patterning lithography at 32 nm and provide extendability to future applications, as well as the evolutionary NSR-S621D, S622D, and S630D immersion scanners for applications down to the 10 nm node and beyond. Most recently, Nikon launched the NSR-S631E ArF immersion scanner. The S631E ensures world-class device patterning and optimum fab productivity to fully satisfy real-world 7 nm node requirements.
Nikon has also been actively developing lithography solutions for ABS, MEMS, and LED-type applications. Nikon MEMS Steppers have extremely small footprints and provide cost-effective solutions that satisfy the requirements for large depth of focus and backside alignment capabilities that are vital in these growing markets.
Nikon. Delivering Real-world Solutions.
Immersion and Multiple Patterning
Over the past decade we have maintained an aggressive roadmap delivering innovative scanner solutions to satisfy the increasingly stringent requirements for immersion and multiple patterning applications.
Deep UV scanners play an essential role in semiconductor manufacturing, and Nikon provides a variety of solutions to meet chip makers’ diverse production requirements.
Nikon i-Line systems deliver the superior performance and cost advantage you expect from the world's lithography leader. Our i-Line solutions provide optimal resolution and overlay with the lowest cost of ownership (CoO).
Steppers for MEMS, LEDs, and More
Nikon Engineering Co. Ltd. continues to expand the MEMS Stepper product line to satisfy the unique photolithography requirements of Air Bearing Surface (ABS) fabrication for magnetic heads, Micro Electro Mechanical Systems (MEMS) and Light Emitting Diodes (LED), as well as optoelectronics, discrete semiconductors and crystal oscillator manufacturing. These specialized Nikon lithography solutions deliver maximum stepper yield at the lowest possible cost.