Immersion and Multiple Patterning

In 2006, the NSR-S609B immersion scanner marked a major milestone in the Nikon immersion program. And, over the past decade we have maintained an aggressive roadmap delivering innovative scanner solutions to satisfy the increasingly stringent requirements for immersion and multiple patterning applications. During that time, Nikon developed the NSR-S620D, based on the pioneering Streamlign platform, to not only enable double patterning lithography at 32 nm, but to provide extendibility to next-generation applications. This was followed by the evolutionary NSR-S621D, S622D, and S630D immersion scanners for applications down to the 10 nm node and beyond.

It is real-world, on-product performance that is vital to chipmakers. The NSR-S631E is the industry’s most advanced scanner for aggressive multiple patterning processes. It ensures world-class device patterning and optimum fab productivity to fully satisfy real-world 7 nm node requirements. With the NSR-S631E, Nikon combines superior immersion technology with innovative software solutions to deliver exceptional manufacturing performance and productivity —now and for the future.