As design rules for new processes become more challenging, dry ArF and KrF scanners must deliver ultra-high productivity with overlay accuracy comparable to immersion systems, as well as exceptional system stability and matching capabilities. Nikon offers the industry-leading NSR-S322F ArF and NSR-S220D KrF scanners, which utilize the innovative Streamlign platform to deliver world-class performance for critical non-immersion layers. The successful combination of the Stream Alignment and Five-Eye FIA systems enables scanner throughput ≥ 230 wafers per hour. In addition, proven Bird’s Eye Control enables single machine overlay accuracy ≤ 2 nm for the S322F and ≤ 3 nm for the S220D, coupled with outstanding overlay stability. Nikon recognizes chipmakers have diverse production objectives, and also offers the NSR-S210D KrF scanner, which employs established Tandem Stage technology to satisfy less-critical 248 nm requirements with low cost of ownership.
The newly released LithoBooster Standalone Alignment Station is a high speed, extremely accurate wafer pre-measurement module for scanners within your manufacturing facility. With LithoBooster, wafer-by-wafer feed forward correction is possible, enabling compensation for processing effects including etching, annealing, CVD/PVD, and more. LithoBooster also provides an open platform for expanded overlay, autofocus, and process control solutions as well.
Industry-leading scanner for dry ArF applications
Industry-leading scanner for KrF applications
A high productivity KrF scanner for sub-critical layers
inline Alignment Station (iAS) and LithoBooster
Nikon developed two revolutionary products specifically focused on optimizing alignment in order to enable cost-effective lithography scaling.