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In 2006, the NSR-S609B immersion scanner marked the first milestone in fulfillment of the Nikon Immersion Solution. And, we continued on the
fast track with the NSR-S610C, with S610C scanners being used successfully in high-volume manufacturing in leading-edge facilities around the
world. These systems are processing more than 2300 wafers per day and delivering defectivity levels on par with dry lithography, while
achieving overlay and aberration performance that meets all production requirements for 45 nm applications and beyond.
Most recently, Nikon began shipping the NSR-S620D ultra-high productivity immersion scanner (NA = 1.35) to meet the aggressive performance requirements for double patterning, and 32 nm applications and beyond. The NSR-S620D is the first scanner to combine inline metrology with a single exposure stage targeting 200 wafers per hour, and a sophisticated hybrid control system to enable 2 nm overlay accuracy.
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NSR-S620D
