• NSR-S610C
• NSR-S609B

Shipment of the NSR-S609B immersion scanner (NA = 1.07) in the beginning of 2006 marked the first milestone in fulfillment of the Nikon Immersion Solution. And, we continued on the fast track starting shipment of the NSR-S610C, the industry’s first 1.30 NA scanner for 45 nm production, in early 2007. Both the S609B and the S610C use proprietary Local Fill Technology, which eliminates bubbles, watermarks, and particles generated by immersion processing. This enables defectivity at the same level as dry scanners. In addition, both systems incorporate the Nikon Tandem Stage and deliver throughput of 130 wafers or more per hour.

45 nm volume production with realistic k₁ values requires a 1.30 NA, and the NSR-S610C satisfies this critical need – using a multi-axial catadioptric lens design optimized for 45 nm manufacturing and 32 nm development.   IC manufacturers worldwide have chosen the S610C for 45 nm high-volume applications because of its early market introduction and Nikon’s proven ability to print immersion exposures with no immersion-induced defects or overlay matching problems.