Nikon introduced a host of new lithography systems in the past several years and now offers the industry’s broadest product range for ArF, KrF, and i-line applications. Nikon continues to invest heavily in new product development and was first to market with the 1.07 NA immersion scanner, the NSR-S609B. Nikon was also first to market with the 1.30 NA immersion scanner, the NSR-S610C, in early 2007. Now, with the NSR-S620D immersion scanner (NA = 1.35), which supports overlay capabilities down to 2 nm and throughput up to 200 wafers per hour, Nikon is once again enabling the next generation of IC manufacturing.

With the delayed adoption of EUVL and the significant cost of lithography systems, it is critical that today’s immersion scanners must be extendible to next-generation applications. Therefore, Nikon developed the S620D, based on the new Streamlign platform, to not just satisfy the aggressive performance requirements for double patterning lithography at 32 nm, but to also be extendible to 22 nm applications and beyond. Most recently, Nikon announced the NSR-S320F, the latest evolution of the Streamlign platform to deliver exceptional performance and productivity for the most critical dry ArF applications.

The Nikon product roadmap is continually refined in collaboration with customers and leading industry organizations. With a proven history of innovation, Nikon lithography systems continue to enable next generation manufacturing