Next generation lithography techniques continue to evolve, therefore to stay competitive, customers need innovative lithography solutions that will keep them on their aggressive technology roadmaps. Nikon offers a complete range of lithography systems that deliver maximized productivity, superior technology, and low cost of ownership. Every Nikon stepper and scanner incorporates our legendary optics and comes with world-class Nikon customer support.

Nikon lithography equipment meets the diverse needs of today’s fab managers with the 2205i14E2 5x stepper, the SF155 wide-field stepper, and the cost-efficient S210D KrF and S310F ArF scanners. Nikon developed the NSR-S620D immersion scanner based on the new Streamlign platform, to enable double patterning (DP) lithography at 32 nm and provide extendibility to next-generation applications. Subsequently, Nikon announced the Streamlign platform-based NSR-S320F scanner to deliver exceptional performance and productivity for critical dry ArF applications, followed by the evolutionary NSR-S621D immersion scanner for 20 nm technology and beyond. Most recently, Nikon launched the NSR-S622D, to satisfy the industry’s most demanding requirements for imaging, overlay accuracy, and ultra-high productivity, which are essential for cost-effective, leading-edge multiple patterning applications.

Nikon has also been actively developing products specifically for ABS, MEMS, and LED-type applications. The NES Mini Steppers have extremely small footprints and provide cost-effective solutions that satisfy the requirements for large depth of focus and backside alignment capabilities that are vital in these growing markets.

Nikon. Evolution in Action.