Nikon offers a complete range of innovative lithography systems that deliver maximized productivity, superior technology, and lowest cost of ownership. Every Nikon stepper and scanner incorporates our legendary optics and comes with world-class Nikon customer support.

Nikon lithography equipment meets the diverse needs of today’s fab managers with the 2205i14E2 5x stepper, the SF155 wide-field stepper, the cost-efficient S210D KrF scanner, the leading-edge S310F ArF scanner, and the S610C hyper-NA immersion scanner. Now, with the NSR-S620D immersion scanner, which supports overlay capabilities down to 2 nm and throughput up to 200 wafers per hour, Nikon is once again enabling the next generation of IC manufacturing.  Nikon developed the S620D (NA = 1.35), based on the new Streamlign platform, to not just satisfy the aggressive performance requirements for double patterning (DP) lithography at 32 nm, but to also be extendible to 22 nm applications.

For IC manufacturers, lithography requirements continue to accelerate. With a proven history of innovation, Nikon will be there to meet the challenge and keep you ahead of the competition.