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November 19, 2003
BELMONT, Calif. –Nov. 19, 2003–Nikon continues its focus on high productivity lithography solutions with the introduction of the NSR-SF130, a scan-field i-line stepper with high throughput and extremely low cost of ownership. The system makes use of leading-edge lens technology to achieve the same wide exposure field (26×33 mm) as DUV scanners, making it ideal...