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September 29, 2004
TOKYO, Japan, VELDHOVEN, the Netherlands and OBERKOCHEN, Germany – September 29, 2004 – Nikon Corporation (Nikon), ASML Holding N.V. (ASML) and Carl Zeiss SMT AG (SMT) have agreed to comprehensive settlement of legal proceedings and cross-license of patents related to lithography equipment used to manufacture semiconductor devices. The Memorandum of Understanding is a binding agreement that...