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November 20, 2004
Advanced Polarization Control Improves Image Contrast by 20 Percent Belmont, California – November 20, 2004 – Nikon Corporation announced it has developed POLANO*, the industry’s first advanced polarized illumination system for IC lithography systems. POLANO improves image contrast by 20 percent, resulting in superior resolution, depth of focus, and critical dimension (CD) uniformity. Polarized illumination control...