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February 16, 2006
Major IC Manufacturer Selects Nikon for 55 nm Production Belmont, California, February 16, 2006 – Nikon Corporation has shipped the world’s first production immersion lithography system. The NSR-S609B, an ArF immersion scanner with the industry’s first hyper-NA projection lens of NA 1.07, shipped in January to a major IC manufacturer. The system is targeted for mass...