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July 6, 2006
Immersion system with 1.30 NA lens will ship by end of 2006 Belmont, California, July 6, 2006 – Nikon Corporation has developed the world’s first lithography system designed to meet the semiconductor industry’s requirements for mass production of 45 nm memory and of 32 nm logic devices. The NSR-S610C, an ArF immersion scanner, includes an advanced...