Nikon Precision | USA & Europe | Nikon Global Site


February 28, 2007
Belmont, California – February 28, 2007 – Nikon Corporation has shipped the world’s first immersion lithography system capable of 45 nm production. The NSR-S610C, an ArF immersion scanner with the industry’s highest projection lens NA of 1.30, shipped to a major IC manufacturer. The system is targeted for mass production of 45 nm devices and can...