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February 20, 2008
Low Risk Solution for 32 nm Process Development Belmont, California – February 20, 2008 – Nikon Corporation has announced they will provide an immersion scanner for Double Patterning, based on the successful NSR-S610C platform, to their customers in the 4th quarter of 2008.  By enhancing the performance of the mature NSR-S610C ArF immersion scanner to address...