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Nikon Announces New Dry ArF Scanner Delivering Superior Performance and Productivity

Tokyo, Japan – November 26, 2014 – Nikon Corporation announced the NSR-S322F scanner delivering superior performance and productivity for the most challenging dry ArF layers. The S322F leverages the proven Streamlign Platform, which is already employed globally and delivering optimal cost of ownership, to satisfy aggressive dry 193 nm requirements. The successful combination of the Stream Alignment and Five-Eye FIA systems enable ultra-high throughput capabilities of up to 230 wafers per hour (96 exposure shots/wafer). In addition, the proven Bird’s Eye Control system uses interferometers in conjunction with encoders to deliver single machine overlay (SMO) ≤ 2 nm with optimal stability, while the matureModular2Structure simplifies installation and maintenance functions. Sales of these industry-leading systems will begin next month.

The semiconductor industry is currently transitioning to development and high volume manufacturing of next-generation process devices, with the majority of critical layers exposed using ArF immersion scanners and incorporating multiple patterning. However, many layers will still be processed using dry single exposure lithography. To achieve this, dry 193 nm scanners that deliver ultra-high productivity with overlay accuracy comparable to immersion systems are essential. The NSR-S322F is the most advanced dry ArF scanner for high volume manufacturing, and builds on established Streamlign platform technology to fully satisfy demanding leading-edge production requirements.

With a continued focus on technology innovations to enable next generation lithography, Nikon continues to introduce new scanners to market that address semiconductor manufacturers’ heightening performance and productivity challenges. “Chipmakers require dry and immersion lithography solutions that deliver outstanding overlay accuracy and exceptional productivity. Streamlign Platform-based scanners perform extremely well in high volume facilities worldwide, and the NSR-S322F is clear evidence of ongoing Nikon innovation to extend crucial 193 nm technology,” stated Hamid Zarringhalam Executive Vice President of Nikon Precision Inc.

About Nikon
Since 1980, Nikon Corporation has been revolutionizing lithography with innovative products and technologies. The company is a worldwide leader in semiconductor lithography systems for the microelectronics manufacturing industry with more than 8,000 (semiconductor) lithography systems installed worldwide. Nikon offers the most extensive selection of production-class steppers and scanners in the industry. These products serve the semiconductor, flat panel display (FPD) and thin-film magnetic head (TFH) industries. Nikon Precision Inc. provides service, training, applications and technical support, as well as sales and marketing for Nikon lithography equipment in North America. For more information about Nikon, access our website at http://www.nikonprecision.com.

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This press release contains forward-looking statements as that term is defined in the Private Securities Reform Act of 1995, which are subject to known and unknown risks and uncertainties that could cause actual results to differ materially from those expressed or implied by such statements Such statements are subject to risks, uncertainties and changes in condition, particularly those related to industry requirements and other risks. The Company undertakes no obligation to update the information in this press release.

For further information, contact:
Holly Magoon, Senior Marketing Manager
Nikon Precision Inc.
holly.magoon@nikon.co