New system improves yield by delivering high-density, wafer alignment mark sampling, ahead of exposure
Tokyo, Japan – December 11, 2025 – Nikon Corporation announced the development of the Litho Booster 1000, its latest alignment station model engineered to enable exceptional overlay accuracy in semiconductor manufacturing. The Litho Booster 1000 provides dense sampling measurements on each wafer and feeds forward precise correction data directly to the lithography system before exposure, improving process control and delivering higher production yield. Nikon expects to launch the system in the second half of 2026.
Designed for maximum flexibility, the Litho Booster 1000 supports semiconductor lithography systems from both Nikon and other Lithography equipment suppliers. Nikon has been delivering alignment station technology to meet customer’s overlay requirements since 2018; the new model provides a major step forward in capability and performance.
With the rapid adoption of 3D device structures, across many semiconductor market segments such as CMOS image sensors, logic devices, NAND flash, and soon DRAM, the industry is facing increasing overlay challenges caused by wafer deformation and misalignment during multi-layer processing and wafer-to-wafer bonding. These steps demand higher-density, more precise wafer measurements to maintain tight overlay tolerances across increasingly complex stacks.
The Litho Booster 1000 addresses these challenges with enhanced multi-point and absolute measurement accuracy resulting in improved device quality and yield, whilst maintaining high productivity throughout the manufacturing process. Development of the system has been supported in part by research results from a project commissioned by Japan’s New Energy and Industrial Technology Development Organization (NEDO).
The information contained in this press release is current as of its date of publication.
About Nikon
Since 1980, Nikon Corporation has been revolutionizing lithography with innovative products and technologies. The company is a worldwide leader in semiconductor lithography systems for the microelectronics manufacturing industry with more than 8,000 (semiconductor) lithography systems installed worldwide. Nikon offers the most extensive selection of production-class steppers and scanners in the industry. These products serve the semiconductor, flat panel display (FPD) and thin-film magnetic head (TFH) industries. Nikon Precision Inc. provides service, training, applications and technical support, as well as sales and marketing for Nikon lithography equipment in North America. For more information about Nikon, access our website at https://www.nikonprecision.com.
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This press release contains forward-looking statements as that term is defined in the Private Securities Reform Act of 1995, which are subject to known and unknown risks and uncertainties that could cause actual results to differ materially from those expressed or implied by such statements. Such statements are subject to risks, uncertainties and changes in condition, particularly those related to industry requirements and other risks. The Company undertakes no obligation to update the information in this press release.
For further information, please contact:
Nikon Precision Marketing Communications at:
NPIcom@nikon.com