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July 12, 2002
High Throughput Scan-Field Stepper Mix-and-Matches to DUV Scanners July 12, 2002 – To create the most cost-effective tool for sub-critical layers of next-generation DRAMs and MPUs, Nikon Corporation has developed a new i-line scan-field stepper, the NSR-SF120. The NSR-SF120 is designed to realize the superior cost performance of a mix-and-match strategy with Nikon DUV scanners, which...
High-throughput Scanner Featuring Ultra-High N.A. Lens Targets DRAMs July 12, 2002 – Targeted at mass production of cutting-edge devices with 110-nm design rules, Nikon Corporation introduced the NSR-S206D. This scanner is the 6th generation in Nikon’s successful KrF scanner series. The NSR-S206D is equipped with the industry’s highest N.A KrF (248nm) lens and provides high throughput...