Nikon Precision | USA & Europe | Global Site

Day

February 19, 2004
Belmont, Calif., February 19, 2004 – Nikon Corporation announced today that it has accelerated its development plans for ArF immersion and will ship a system with a projection lens NA of greater than or equal to 1.0 in the second half of 2005. Nikon’s previous plan was to market an immersion system with an NA of...