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June 30, 2005
New Tandem Stage system enables 45 nm process development Belmont, California – June 30, 2005 – Nikon Corporation has developed the world’s first lithography system with a hyper NA lens. The NSR-S609B, an ArF immersion scanner with the industry’s highest NA projection lens of 1.07, is targeted at mass production of 55 nm and development of...