Nikon Precision | USA & Europe | Global Site

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November 20, 2006
New Stepper Reduces Costs for Sub-Critical Layers BELMONT, California — November 20, 2006 — Nikon continues its focus on high productivity lithography solutions with the introduction of the NSR-SF150, a scan field i-line stepper with ultra high throughput and extremely low cost of ownership. Throughput has been increased by more than 50% to 180 wafers per...