Tokyo, Japan – December 11, 2025 – Nikon Corporation announced the development of the Litho Booster 1000, its latest alignment station model engineered to enable exceptional overlay accuracy in semiconductor manufacturing. The Litho Booster 1000 provides dense sampling measurements on each wafer and feeds forward precise correction data directly to the lithography system before exposure,...

Tokyo, Japan – September 25, 2025 – Nikon Corporation announces the launch of its latest ArF scanner, the NSR-S333F, which delivers industry-leading overlay accuracy*¹ alongside exceptional productivity.

Tokyo, Japan – July 16, 2025 – Nikon Corporation will begin accepting orders for the Digital Lithography System DSP-100, designed for back-end semiconductor manufacturing processes, starting in July 2025.

Tokyo, Japan – October 22, 2024 – Nikon Corporation (Nikon) is developing a digital lithography system with resolution of one micron (L/S) and high productivity for advanced semiconductor packaging applications. This product is scheduled to be released in Nikon’s fiscal year 2026.

Nikon Corporation is one of only 29 Distinguished Award recipients across Intel’s global supply chain. Tokyo, Japan – March 28, 2024 – Nikon Corporation (Nikon) is proud to announce that it has earned Intel’s EPIC Distinguished Supplier Award. Through its dedication to Excellence, Partnership, Inclusion, and Continuous (EPIC) quality improvement, Nikon Corporation has achieved a level...

Advanced solution for critical layers, and supports 3D semiconductor device production Tokyo, Japan – December 6, 2023 – Nikon Corporation (Nikon) is pleased to announce the release of the NSR-S636E ArF immersion scanner, with system sales launching in January 2024. With the highest productivity of any lithography system across the impressive history of Nikon, the NSR-S636E...

Supports a variety of semiconductor devices and integrates well with existing fab equipment and operations Tokyo, Japan – August 31, 2023 – Nikon Corporation is pleased to announce the release of the NSR-2205iL1 5x reduction i-line stepper, which was developed to manufacture a variety of devices including power and communications semiconductors, and Micro Electro Mechanical Systems...

Tokyo, Japan – October 18, 2021 – Nikon Corporation (Nikon) announced it is currently developing the next-generation NSR-S636E ArF immersion scanner, which will deliver superior overlay accuracy and ultra-high throughput to support manufacturing of the most critical semiconductor devices. Product sales are scheduled to begin in 2023. As the digital transformation (DX) accelerates, there is...