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Nikon Announces 450 mm ArF Immersion Scanner at SUNY Polytechnic Institute is Transitioning to Wafer Patterning

Nikon Corporation (Kazuo Ushida, President) announced the world’s first ever 450 mm immersion scanner, the Nikon NSR-S650D, has been installed at SUNY Polytechnic Institute’s Colleges of Nanoscale Science and Engineering (SUNY Poly CNSE) and is transitioning to wafer patterning. This milestone is a significant achievement in accelerating development of the next generation of computer chips.

In July of 2013, Nikon announced it had entered into a partnership with SUNY Poly CNSE to develop next-generation 450 mm photolithography technology. In April of this year, Governor Andrew M. Cuomo announced installation of the world’s first ever 450 mm immersion scanner had begun at the $20 billion SUNY Poly CNSE Albany NanoTech Complex.

Toshikazu Umatate, General Manager of the Nikon Corporation Semiconductor Lithography Business Unit said, “Our 450 mm program is advancing well. The NSR-S650D shipped earlier this year as planned, and we will transition to wafer patterning soon. The program’s steady progress is a direct result of tireless collaborative efforts across the 450 mm consortium.” Umatate added, “Nikon is dedicated to supporting the industry’s drive to next-generation semiconductor manufacturing through continuous innovations in lithography system performance and productivity.”

“As a testament to Governor Andrew M. Cuomo’s leadership making New York State the epicenter for globally recognized high-tech research, development, and commercialization, the installation of the world’s first Nikon 450 mm immersion scanner and its deployment for wafer patterning inside SUNY Poly CNSE’s state-of-the-art cleanroom facilities is a milestone for the Global 450 mm Consortium, and it proves that the industry’s transition to the 450 mm platform technology is gaining further momentum,” said Paul Farrar, Jr., General Manager of the Global 450 mm Consortium (G450C) and CNSE Vice President for Manufacturing Innovation. “Governor Cuomo’s strategic, high-tech investments are enabling the industry’s transition to 450 mm wafer technology, and we are proud that, as a result, this latest development is yet another that is taking place in New York State. Through the Governor’s leadership and foresight, this game-changing initiative continues to drive progress, as well as career and business opportunities, laying the foundation for advanced technologies that will power innovation far into the future.”

NSR-S650D ArF immersion Scanner

About Nikon

Since 1980, Nikon Corporation has been revolutionizing lithography with innovative products and technologies. The company is a worldwide leader in semiconductor lithography systems for the microelectronics manufacturing industry with more than 8,000 (semiconductor) lithography systems installed worldwide. Nikon offers the most extensive selection of production-class steppers and scanners in the industry. These products serve the semiconductor, flat panel display (FPD) and thin-film magnetic head (TFH) industries. Nikon Precision Inc. provides service, training, applications and technical support, as well as sales and marketing for Nikon lithography systems in North America. For more information about Nikon, access our website at https://www.nikonprecision.com.

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This press release contains forward-looking statements as that term is defined in the Private Securities Reform Act of 1995, which are subject to known and unknown risks and uncertainties that could cause actual results to differ materially from those expressed or implied by such statements. Such statements are subject to risks, uncertainties and changes in condition, particularly those related to industry requirements and other risks. The Company undertakes no obligation to update the information in this press release.

For further information, contact:
Holly Magoon, Senior Marketing Manager
Nikon Precision Inc.
holly.magoon@nikon.com