Nikon completes new suite of lithography solutions with two new scanners
Belmont, California – July 11, 2007 – With a focus on leading-edge technology and high productivity, Nikon continues to introduce new lithography solutions to market at a rapid pace with two new DUV scanners – the NSR-S310F ArF scanner and the NSR-S210D KrF scanner. Both systems are built on the Tandem Stage platform, which enables significant productivity improvements and enhanced overlay performance. In the last year, Nikon has announced a complete new suite of products for i-line, KrF, ArF, and immersion applications.
The S310F is the most advanced ArF scanner for high volume manufacturing of 65 nm or smaller devices. The system uses Nikon Tandem Stage technology to increase throughput, improve overlay accuracy, and enhance long-term stability. With the throughput increased to 174 wafers per hour – a 20% increase over the previous generation Nikon scanner – cost of ownership is significantly reduced. The Tandem Stage also helped reduced overlay to a mere 7 nm.
The projection optics (0.92 NA) and illumination system provide superior image quality and CD control across the wafer with the lowest aberration and flare levels in the industry. The fourth-generation Nikon polarization control system, POLANO, and optional infrared aberration control (IAC) provide further imaging benefits.
The S210D with an NA of 0.82 is designed for patterning layers down to 110 nm. The system achieves 176 wafers per hour and 9 nm overlay accuracy.
With the introduction of the S310F and S210D systems, all Nikon scanners are now on a common Tandem Stage platform. Having all scanner technologies on one platform enables manufacturing efficiencies, reduces cost over time, standardizes software across platforms, and simplifies field support. The new platform design will also reduce tool installation time, which is becoming increasingly important to our customers.
“With the release of these new scanners Nikon has executed our strategy and introduced a complete new product lineup in the past year. In addition to migrating our entire scanner lineup to the high productivity Tandem Stage platform, we continued our technical leadership by shipping the world’s first 1.30 NA immersion scanner in February, well before the competition,” said Kazuo Ushida, President of the Precision Equipment Company, Nikon Corporation.
Since 1980, Nikon Corporation has been revolutionizing lithography with innovative products and technologies. The company is a worldwide leader in lithography equipment for the microelectronics manufacturing industry with more than 7,800 exposure systems installed worldwide. Nikon offers the most extensive selection of production-class steppers and scanners in the industry. These products serve the semiconductor, flat panel display (LCD) and thin-film magnetic head (TFH) industries. Nikon Precision Inc. provides service, training, applications and technical support, as well as sales and marketing for Nikon lithography equipment in North America. For more information about Nikon, access our web site at www.nikonprecision.com
Forward Looking Statements
This press release contains forward-looking statements as that term is defined in the Private Securities Reform Act of 1995, which are subject to known and unknown risks and uncertainties that could cause actual results to differ materially from those expressed or implied by such statements Such statements are subject to risks, uncertainties and changes in condition, particularly those related to industry requirements and other risks. The Company undertakes no obligation to update the information in this press release.
Director of Marketing
Nikon Precision Inc.
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