Nikon Announces New Dry ArF Scanner Delivering World-Class Overlay and Productivity
TOKYO, Japan – December 5, 2011 –Nikon Corporation announced the NSR-S320F scanner delivering ultra-high productivity and superior overlay accuracy for the most challenging dry ArF layers. The S320F adopts the Streamlign Platform already employed globally and delivering optimal cost of ownership for NSR-S620D immersion scanners. The successful combination of the Stream Alignment and Five-Eye FIA systems enable world-class throughput capabilities of up to 200 wafers per hour. In addition, the proven Bird’s Eye Control system uses interferometers in conjunction with encoders to deliver overlay accuracy ≤ 3 nm with optimal stability, while the mature Modular2 Structure simplifies installation and maintenance functions. The scanners will begin shipping in the fourth quarter of 2011.
The semiconductor industry is currently transitioning to development and high volume manufacturing of 20 nm generation process devices, with the most critical layers exposed using ArF immersion scanners and incorporating double patterning. However, to minimize costs many layers will still be processed using dry single exposure lithography. To achieve this, dry ArF scanners that are able to deliver ultra-high productivity with overlay accuracy comparable to immersion systems are imperative. The NSR-S320F is the most advanced dry ArF scanner for high volume manufacturing, and fully satisfies these challenging requirements.
With a continued focus on technology innovations to enable next generation lithography, Nikon continues to introduce new scanners to market that satisfy IC makers’ increasingly aggressive performance and productivity requirements. “While the most critical layers certainly require ArF immersion, there is a very real need for dry lithography solutions that deliver ultra-high productivity with exceptional overlay accuracy. Our Streamlign Platform-based immersion scanners continue to gain worldwide customer acceptance and the NSR-S320F is the logical evolution of proven Nikon technology to satisfy this dry ArF market,” stated Takao Naito, Chief Executive Officer and President of Nikon Precision Inc.
Since 1980, Nikon Corporation has been revolutionizing lithography with innovative products and technologies. The company is a worldwide leader in lithography equipment for the microelectronics manufacturing industry with more than 8,000 exposure systems installed worldwide. Nikon offers the most extensive selection of production-class steppers and scanners in the industry. These products serve the semiconductor, flat panel display (LCD) and thin-film magnetic head (TFH) industries. Nikon Precision Inc. provides service, training, applications and technical support, as well as sales and marketing for Nikon lithography equipment in North America. For more information about Nikon, access our website at http://www.nikonprecision.com.
This press release contains forward-looking statements as that term is defined in the Private Securities Reform Act of 1995, which are subject to known and unknown risks and uncertainties that could cause actual results to differ materially from those expressed or implied by such statements Such statements are subject to risks, uncertainties and changes in condition, particularly those related to industry requirements and other risks. The Company undertakes no obligation to update the information in this press release.
For further information, contact:
Holly Magoon, Marketing Manager
Nikon Precision Inc.