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Immersion and Multiple Patterning
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i-Line
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Alignment Stations
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News & Events
SEMICON West 2026
San Francisco, CA
October 13 – 15, 2026
SEMICON West
San Francisco, CA
October 13-15, 2026
Latest News
/
June 5, 2026
Development of a 1.5 µm Resolution Digital Lithography System
/
December 11, 2025
Nikon Introduces the Litho Booster 1000, a Next-Generation Alignment Station Designed to facilitate Breakthrough Overlay Accuracy for Advanced 3D Devices
/
September 25, 2025
Nikon Launches New Dry ArF Scanner for Fine Patterning across Logic, Memory, and Sensors
/
July 16, 2025
Nikon Announces First Back-End Process Lithography System
/
October 22, 2024
Nikon Announces Development of a Digital Lithography System with 1.0 micron (L/S*
1
) Resolution
/
March 28, 2024
Nikon Corporation Earns Intel’s 2024 EPIC Distinguished Supplier Award with Safety Distinction
/
December 6, 2023
Nikon Releases the New NSR-S636E ArF Immersion Scanner
/
August 31, 2023
Nikon Releases the NSR-2205iL1 5x Reduction i-Line Stepper
/
October 18, 2021
Nikon Announces Development of the NSR-S636E ArF Immersion Scanner
About Us
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